scholarly journals The Fabrication of Micro/Nano Structures by Laser Machining

Nanomaterials ◽  
2019 ◽  
Vol 9 (12) ◽  
pp. 1789 ◽  
Author(s):  
Liangliang Yang ◽  
Jiangtao Wei ◽  
Zhe Ma ◽  
Peishuai Song ◽  
Jing Ma ◽  
...  
Keyword(s):  
Focused Ion Beam ◽  
Piezoelectric Materials ◽  
Ion Beam ◽  
New Technology ◽  
Laser Machining ◽  
Step Method ◽  
Surface Plasma Resonance ◽  
Nano Structure ◽  
Nano Structures ◽  
Wide Range

Micro/nano structures have unique optical, electrical, magnetic, and thermal properties. Studies on the preparation of micro/nano structures are of considerable research value and broad development prospects. Several micro/nano structure preparation techniques have already been developed, such as photolithography, electron beam lithography, focused ion beam techniques, nanoimprint techniques. However, the available geometries directly implemented by those means are limited to the 2D mode. Laser machining, a new technology for micro/nano structural preparation, has received great attention in recent years for its wide application to almost all types of materials through a scalable, one-step method, and its unique 3D processing capabilities, high manufacturing resolution and high designability. In addition, micro/nano structures prepared by laser machining have a wide range of applications in photonics, Surface plasma resonance, optoelectronics, biochemical sensing, micro/nanofluidics, photofluidics, biomedical, and associated fields. In this paper, updated achievements of laser-assisted fabrication of micro/nano structures are reviewed and summarized. It focuses on the researchers’ findings, and analyzes materials, morphology, possible applications and laser machining of micro/nano structures in detail. Seven kinds of materials are generalized, including metal, organics or polymers, semiconductors, glass, oxides, carbon materials, and piezoelectric materials. In the end, further prospects to the future of laser machining are proposed.

FIB Micromachining and Nano-Structure Fabrication

1999 ◽  
Author(s):  
Raymond A. Lee ◽  
Patrick J. Wolpert
Keyword(s):  
High Precision ◽  
Focused Ion Beam ◽  
Ion Beam ◽  
Biological Applications ◽  
Optical Lens ◽  
Nano Structure ◽  
Beam System ◽  
Afm Tips ◽  
Established Technique ◽  
Made In

Abstract FIB Micromachining has long been an established technique, but until recently it has been overshadowed by the more mainstream semiconductor application of the Focused Ion Beam system. Nano- Structure fabrication using the FIB system has become more popular recently due to several factors. The need for sub-micron structures have grown significantly due to a need for enhanced optical and biological applications. Another reason for the growth in micromachining is the improvement made in the ability of FIB systems to produce geometric shapes with high precision. With the latest high-end FIB systems, it is possible to produce microstructures with tens of nano-meters of precision. Optical lens, AFM tips, and nano-apertures are all part of the growing application for FIB Micromachining. This paper will discuss the ability and limitations of the FIB system and some possible application for FIB Micromachining.

A method to improve the quality of 2.5 dimensional micro-and nano-structures produced by focused ion beam machining

Micron ◽  
2017 ◽  
Vol 101 ◽  
pp. 8-15 ◽  
Author(s):  
Daniele De Felicis ◽  
Muhammad Zeeshan Mughal ◽  
Edoardo Bemporad
Keyword(s):  
Focused Ion Beam ◽  
Ion Beam ◽  
Nano Structures

scholarly journals An Experiment-Based Profile Function for the Calculation of Damage Distribution in Bulk Silicon Induced by a Helium Focused Ion Beam Process

Sensors ◽  
2020 ◽  
Vol 20 (8) ◽  
pp. 2306 ◽  
Author(s):  
Qianhuang Chen ◽  
Tianyang Shao ◽  
Yan Xing
Keyword(s):  
Beam Energy ◽  
Focused Ion Beam ◽  
Crystalline Silicon ◽  
Ion Beam ◽  
Single Crystalline Silicon ◽  
Nanostructure Fabrication ◽  
Profile Function ◽  
Single Crystalline ◽  
Prediction Function ◽  
Wide Range

The helium focused ion beam (He-FIB) is widely used in the field of nanostructure fabrication due to its high resolution. Complicated forms of processing damage induced by He-FIB can be observed in substrates, and these damages have a severe impact on nanostructure processing. This study experimentally investigated the influence of the beam energy and ion dose of He-FIB on processing damage. Based on the experimental results, a prediction function for the amorphous damage profile of the single-crystalline silicon substrate caused by incident He-FIB was proposed, and a method for calculating the amorphous damage profile by inputting ion dose and beam energy was established. Based on one set of the amorphous damage profiles, the function coefficients were determined using a genetic algorithm. Experiments on single-crystalline silicon scanned by He-FIB under different process parameters were carried out to validate the model. The proposed experiment-based model can accurately predict the amorphous damage profile induced by He-FIB under a wide range of different ion doses and beam energies.

Assessment of Deformation using the Focused Ion Beam Technique

2000 ◽  
Vol 6 (S2) ◽  
pp. 530-531
Author(s):  
M.G. Burke ◽  
P.T. Duda ◽  
G. Botton ◽  
M. W. Phaneuf
Keyword(s):  
Focused Ion Beam ◽  
Ion Beam ◽  
Site Specificity ◽  
Alloy 600 ◽  
The Past ◽  
Transmission Electron ◽  
Wide Range ◽  
Potential Applications ◽  
Beam Technique ◽  
Significant Attention

Focused Ion Beam (FIB) micromachining techniques have gained significant attention over the past few years as a promising method for the preparation of a variety of metallic and nonmetallic materials for subsequent characterization using transmission electron microscopy (TEM) The advantage of the FIB in terms of site specificity and speed for the preparation of uniform electron transparent sections has opened a wide range of potential applications in materials characterization. The ability to image the sample in the FIB can also provide important microstructural data for materials analysis. In this study, both conventionally electropolished and FIB-ed specimens were prepared in order to characterize the microstructure of a commercially-produced tube of Alloy 600 (approximately Ni-15 Cr-10 Fe- 0.05 C). The electropolished samples were prepared using a solution of 20% HClO4 - 80% CH3OH at ∼-40°C. The FIB sections were obtained from a cross-section of the tube that had been mechanically thinned to ∼100 μm. The section was thinned in a Micrion 2500 FIB system with a Ga ion beam at 50 kV accelerating voltage.

scholarly journals Sample Preparation Methodologies for In Situ Liquid and Gaseous Cell Analytical Transmission Electron Microscopy of Electropolished Specimens

2016 ◽  
Vol 22 (6) ◽  
pp. 1350-1359 ◽  
Author(s):  
Xiang Li Zhong ◽  
Sibylle Schilling ◽  
Nestor J. Zaluzec ◽  
M. Grace Burke
Keyword(s):  
Electron Microscopy ◽  
Transmission Electron Microscopy ◽  
Focused Ion Beam ◽  
General Procedure ◽  
Ion Beam ◽  
Metals And Alloys ◽  
Stainless Steel Sample ◽  
Transmission Electron ◽  
Wide Range

AbstractIn recent years, an increasing number of studies utilizing in situ liquid and/or gaseous cell scanning/transmission electron microscopy (S/TEM) have been reported. Because of the difficulty in the preparation of suitable specimens, these environmental S/TEM studies have been generally limited to studies of nanoscale structured materials such as nanoparticles, nanowires, or sputtered thin films. In this paper, we present two methodologies which have been developed to facilitate the preparation of electron-transparent samples from conventional bulk metals and alloys for in situ liquid/gaseous cell S/TEM experiments. These methods take advantage of combining sequential electrochemical jet polishing followed by focused ion beam extraction techniques to create large electron-transparent areas for site-specific observation. As an example, we illustrate the application of this methodology for the preparation of in situ specimens from a cold-rolled Type 304 austenitic stainless steel sample, which was subsequently examined in both 1 atm of air as well as fully immersed in a H2O environment in the S/TEM followed by hyperspectral imaging. These preparation techniques can be successfully applied as a general procedure for a wide range of metals and alloys, and are suitable for a variety of in situ analytical S/TEM studies in both aqueous and gaseous environments.

scholarly journals Applications of Focused Ion Beam (FIB) on Yeast Cell & SARS Virus

2007 ◽  
Vol 15 (5) ◽  
pp. 42-43
Author(s):  
H. L. Hing ◽  
C. Burkhardt ◽  
P. Gnauck ◽  
S. Sally ◽  
H. Gelderbloms ◽  
...  
Keyword(s):  
Osmium Tetroxide ◽  
Focused Ion Beam ◽  
Ion Beam ◽  
High Energy ◽  
Alcohol Concentration ◽  
Yeast Cells ◽  
Virus Particles ◽  
Freeze Dried ◽  
Wide Range ◽  
Material Sciences

The focused ion beam (FIB) is a relatively novel technique to biomedical electron microscopy as it open up new means for the observations and examinations of a wide range of biomedical and biological materials. The focused ion beam, or FIB tool has been utilized mainly in the fields of material sciences and industry. The (FIB) uses high-energy gallium ions to precisely and accurately section or mill samples. Lately FIB method have been used to prepare biological samples such as yeast cells and virus particles. Yeast cells Schwanniomyces occidentalis S. occidentalis were prepared by vacuum sucking them into cellulose tubing, plunge freezing them in liquid nitrogen, followed by chemical fixation in glutaraldehye and postfixed with osmium tetroxide, dehydrated in a series of ascending alcohol concentration up to absolute alcohol, then freeze dried overnight. In the case of SARS virus, the tissue culture containing virus particles was chemically fixed with glutaraldehyde, dehydrated in ascending order of alcohol concentrations and then freeze dried.

In-Situ Frequency Tuning of Electrostatically Actuated Vibrating Nano Structures Using Focused Ion Beam

2006 ◽  
Author(s):  
Jiyoung Chang ◽  
Jongbaeg Kim ◽  
Byung-Kwon Min ◽  
Sang Jo Lee ◽  
Liwei Lin
Keyword(s):  
Resonant Frequency ◽  
Focused Ion Beam ◽  
Frequency Tuning ◽  
Electrostatic Force ◽  
Ion Beam ◽  
Chemical Vapor ◽  
Fem Analysis ◽  
Experimental Result ◽  
Nano Structures

Schemes for in-situ resonant frequency tuning of nano scale vibrating structures using Focused Ion Beam (FIB) sputtering and FIB-Chemical Vapor Deposition (CVD) are presented. This approach introduces precisely controlled permanent increase or decrease of resonant frequencies on processed nano structures, enabling the frequency adjustment when the desired resonant frequency is higher or lower than the actual frequency of the fabricated resonators. The vibration is induced by electrostatic force between resonator and stator using 0~10V AC input and all the processes including fabrication of nanostructure, electrostatic actuation, vibration observation and frequency tuning in either higher or lower direction were successfully conducted in single FIB chamber. The range of the frequency tuned from 600kHz initial resonant frequency is +6kHz with -1.9μm and -65kHz with +1.1μm length change of the nano-resonator respectively. Structural FEM analysis result is compared with the experimental result.

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