scholarly journals Production of High-Density Capacitively Coupled Plasma with RF Multi-Hollow Cathode and/or High Secondary Electron Emission for DLC Film Preparation

2009 ◽  
Vol 6 (S1) ◽  
pp. S458-S461 ◽  
Author(s):  
Yasunori Ohtsu ◽  
Chisa Nakamura ◽  
Tatsuya Misawa ◽  
Hiroharu Fujita ◽  
Morito Akiyama ◽  
...  
Keyword(s):  
Hollow Cathode ◽  
Electron Emission ◽  
Secondary Electron ◽  
Secondary Electron Emission ◽  
High Density ◽  
Capacitively Coupled ◽  
Dlc Film ◽  
Film Preparation ◽  
Capacitively Coupled Plasma

scholarly journals Influence of the secondary electron emission on the characteristics of radio frequency plasmas

2011 ◽  
Vol 65 (1) ◽  
pp. 1-8
Author(s):  
Aleksandar Bojarov ◽  
Marija Radmilovic-Radjenovic ◽  
Marija Savic
Keyword(s):  
Electron Emission ◽  
Metal Surfaces ◽  
Secondary Electron ◽  
Plasma Reactor ◽  
Secondary Electron Emission ◽  
Secondary Emission ◽  
Dual Frequency ◽  
Capacitively Coupled ◽  
Rf Plasmas ◽  
Capacitively Coupled Plasma

In this paper the influence of secondary emission on the characteristics of RF plasmas has been studied. An asymmetrical dual-frequency capacitively coupled plasma reactor has been modeled with one dimensional PIC/MCC (Particle in Cell with Implemented Monte Carlo Collisions) code. The main feature of the modeling code represents the realistic model of the ion-induced secondary electron emission. Secondary emission of electrons is one of the important processes that effects the characteristics of rf plasmas. For modeling the secondary yield per ion, we have used equations proposed by Phelps and Petrovic (Plasma Sources Sci. Technol. 8 (1999) R21-R44) for differently treated metal surfaces. In the model, the energy dependence of the yields per ion for differently treated metal surfaces has been implemented. Results are compared for yields for the so called ?dirty? and ?clean? surfaces, and the spatial profiles of charged particles and ion energy distributions were observed. The simulation results indicate that the plasma characteristics are greatly affected by the ion-induced secondary emission, changing the overall parameters of dual-frequency capacitively coupled plasma reactors especially in applications as etching devices. Conclusion is that an exact model of the secondary electron emission should be included, as to ensure better agreement between simulation and experiment.

scholarly journals The Influence of Secondary Electron Emission and Electron Reflection on a Capacitively Coupled Oxygen Discharge

Atoms ◽  
2018 ◽  
Vol 6 (4) ◽  
pp. 65 ◽  
Author(s):  
Andrea Proto ◽  
Jon Gudmundsson
Keyword(s):  
Electron Density ◽  
Electron Energy ◽  
Electron Emission ◽  
Secondary Electron ◽  
Probability Function ◽  
Secondary Electron Emission ◽  
Capacitively Coupled ◽  
Electron Reflection ◽  
Oxygen Discharge ◽  
Plasma Bulk

The one-dimensional object-oriented particle-in-cell Monte Carlo collision code oopd1 is applied to explore the role of secondary electron emission and electron reflection on the properties of the capacitively-coupled oxygen discharge. At low pressure (10 mTorr), drift-ambipolar heating of the electrons dominates within the plasma bulk, while at higher pressure (50 mTorr), stochastic electron heating in the sheath region dominates. Electron reflection has negligible influence on the electron energy probability function and only a slight influence on the electron heating profile and electron density. Including ion-induced secondary electron emission in the discharge model introduces a high energy tail to the electron energy probability function, enhances the electron density, lowers the electronegativity, and increases the effective electron temperature in the plasma bulk.

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