A Multiscale Study of the Epitaxial CVD of Si from Chlorosilanes

Multiscale Modeling in Epitaxial Growth - ISNM International Series of Numerical Mathematics ◽

10.1007/3-7643-7343-1_3 ◽

2005 ◽

pp. 29-39

Author(s):

Carlo Cavallotti ◽

Davide Moscatelli ◽

Alessandro Veneroni

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