Reactive force-field molecular dynamics simulation for the surface reaction of SiH (x = 2–4) species on Si(1 0 0)-(2 × 1):H surfaces in chemical vapor deposition processes

2022 ◽  
Vol 204 ◽  
pp. 111193
Author(s):  
Naoya Uene ◽  
Takuya Mabuchi ◽  
Masaru Zaitsu ◽  
Shigeo Yasuhara ◽  
Takashi Tokumasu
Keyword(s):  
Molecular Dynamics ◽  
Chemical Vapor Deposition ◽  
Molecular Dynamics Simulation ◽  
Force Field ◽  
Vapor Deposition ◽  
Surface Reaction ◽  
Chemical Vapor ◽  
Dynamics Simulation ◽  
Reactive Force ◽  
Deposition Processes

scholarly journals Molecular Dynamics Simulation of Chemical Vapor Deposition of Amorphous Carbon: Dependence on H/C Ratio of Source Gas

2011 ◽  
Vol 50 (1S1) ◽  
pp. 01AB01 ◽  
Author(s):  
Atsushi M. Ito ◽  
Arimichi Takayama ◽  
Seiki Saito ◽  
Noriyasu Ohno ◽  
Shin Kajita ◽  
...  
Keyword(s):  
Molecular Dynamics ◽  
Chemical Vapor Deposition ◽  
Molecular Dynamics Simulation ◽  
Amorphous Carbon ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Dynamics Simulation
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