Reactive force-field molecular dynamics simulation for the surface reaction of SiH (x = 2–4) species on Si(1 0 0)-(2 × 1):H surfaces in chemical vapor deposition processes

2022 ◽  
Vol 204 ◽  
pp. 111193
Author(s):  
Naoya Uene ◽  
Takuya Mabuchi ◽  
Masaru Zaitsu ◽  
Shigeo Yasuhara ◽  
Takashi Tokumasu
Keyword(s):  
Molecular Dynamics ◽  
Chemical Vapor Deposition ◽  
Molecular Dynamics Simulation ◽  
Force Field ◽  
Vapor Deposition ◽  
Surface Reaction ◽  
Chemical Vapor ◽  
Dynamics Simulation ◽  
Reactive Force ◽  
Deposition Processes

Reactive Force-Field Molecular Dynamics Study of SiGe Thin Film Growth in Plasma Enhanced Chemical Vapor Deposition Processes

2020 ◽  
Vol 98 (5) ◽  
pp. 177-184
Author(s):  
Naoya Uene ◽  
Takuya Mabuchi ◽  
Masaru Zaitsu ◽  
Shigeo Yasuhara ◽  
Takashi Tokumasu
Keyword(s):  
Thin Film ◽  
Molecular Dynamics ◽  
Chemical Vapor Deposition ◽  
Force Field ◽  
Vapor Deposition ◽  
Film Growth ◽  
Chemical Vapor ◽  
Thin Film Growth ◽  
Reactive Force ◽  
Deposition Processes

Reactive Force-Field Molecular Dynamics Study of SiGe Thin Film Growth in Plasma Enhanced Chemical Vapor Deposition Processes

2020 ◽  
Vol MA2020-02 (24) ◽  
pp. 1717-1717
Author(s):  
Naoya Uene ◽  
Takuya Mabuchi ◽  
Masaru Zaitsu ◽  
Shigeo Yasuhara ◽  
Takashi Tokumasu
Keyword(s):  
Thin Film ◽  
Molecular Dynamics ◽  
Chemical Vapor Deposition ◽  
Force Field ◽  
Vapor Deposition ◽  
Film Growth ◽  
Chemical Vapor ◽  
Thin Film Growth ◽  
Reactive Force ◽  
Deposition Processes

Molecular dynamics simulation of graphene growth on Ni(100) facet by chemical vapor deposition

2014 ◽  
Vol 115 (2) ◽  
pp. 024311 ◽  
Author(s):  
R. Rasuli ◽  
Kh. Mostafavi ◽  
J. Davoodi
Keyword(s):  
Molecular Dynamics ◽  
Chemical Vapor Deposition ◽  
Molecular Dynamics Simulation ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Dynamics Simulation ◽  
Graphene Growth

scholarly journals Molecular Dynamics Simulation of Chemical Vapor Deposition of Amorphous Carbon: Dependence on H/C Ratio of Source Gas

2011 ◽  
Vol 50 (1S1) ◽  
pp. 01AB01 ◽  
Author(s):  
Atsushi M. Ito ◽  
Arimichi Takayama ◽  
Seiki Saito ◽  
Noriyasu Ohno ◽  
Shin Kajita ◽  
...  
Keyword(s):  
Molecular Dynamics ◽  
Chemical Vapor Deposition ◽  
Molecular Dynamics Simulation ◽  
Amorphous Carbon ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Dynamics Simulation

scholarly journals Molecular Dynamics Simulation of Chemical Vapor Deposition of Amorphous Carbon: Dependence on H/C Ratio of Source Gas

2011 ◽  
Vol 50 ◽  
pp. 01AB01 ◽  
Author(s):  
Atsushi M. Ito ◽  
Arimichi Takayama ◽  
Seiki Saito ◽  
Noriyasu Ohno ◽  
Shin Kajita ◽  
...  
Keyword(s):  
Molecular Dynamics ◽  
Chemical Vapor Deposition ◽  
Molecular Dynamics Simulation ◽  
Amorphous Carbon ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Dynamics Simulation

scholarly journals Molecular Dynamics Simulation of Silicon Dioxide Etching by Hydrogen Fluoride Using the Reactive Force Field

ACS Omega ◽  
2021 ◽  
Author(s):  
Dong Hyun Kim ◽  
Seung Jae Kwak ◽  
Jae Hun Jeong ◽  
Suyoung Yoo ◽  
Sang Ki Nam ◽  
...  
Keyword(s):  
Molecular Dynamics ◽  
Molecular Dynamics Simulation ◽  
Silicon Dioxide ◽  
Force Field ◽  
Hydrogen Fluoride ◽  
Dynamics Simulation ◽  
Reactive Force ◽  
Reactive Force Field

Molecular Dynamics Simulation Studies of H Diffusion in SOFC Anode Using Reactive Force Field

2013 ◽  
Vol 57 (1) ◽  
pp. 2649-2654
Author(s):  
L. C. Saha ◽  
K. Nakao ◽  
H. Kohno ◽  
T. Ishimoto ◽  
M. Koyama
Keyword(s):  
Molecular Dynamics ◽  
Molecular Dynamics Simulation ◽  
Force Field ◽  
Dynamics Simulation ◽  
Simulation Studies ◽  
Reactive Force ◽  
Reactive Force Field ◽  
Sofc Anode
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