In-situ Probing the Near-Surface Structural Thermal Stability of High-Nickel Layered Cathode Materials

2022 ◽  
Author(s):  
Jiyang Li ◽  
Haiming Hua ◽  
Xiangbang Kong ◽  
Huiya Yang ◽  
Pengpeng Dai ◽  
...  
Keyword(s):  
Thermal Stability ◽  
Cathode Materials ◽  
Near Surface ◽  
High Nickel ◽  
Layered Cathode Materials ◽  
Thermal Stability Of

scholarly journals Structural Changes and Thermal Stability of Charged LiNixMnyCozO2 Cathode Materials Studied by Combined In Situ Time-Resolved XRD and Mass Spectroscopy

2014 ◽  
Vol 6 (24) ◽  
pp. 22594-22601 ◽  
Author(s):  
Seong-Min Bak ◽  
Enyuan Hu ◽  
Yongning Zhou ◽  
Xiqian Yu ◽  
Sanjaya D. Senanayake ◽  
...  
Keyword(s):  
Thermal Stability ◽  
Mass Spectroscopy ◽  
Cathode Materials ◽  
Structural Changes ◽  
Time Resolved ◽  
Thermal Stability Of

scholarly journals Tracking the Influence of Thermal Expansion and Oxygen Vacancies on the Thermal Stability of Ni‐Rich Layered Cathode Materials

2020 ◽  
Vol 7 (12) ◽  
pp. 1902413 ◽  
Author(s):  
Eunkang Lee ◽  
Shoaib Muhammad ◽  
Taewhan Kim ◽  
Hyunchul Kim ◽  
Wontae Lee ◽  
...  
Keyword(s):  
Thermal Stability ◽  
Thermal Expansion ◽  
Cathode Materials ◽  
Oxygen Vacancies ◽  
Layered Cathode Materials ◽  
Thermal Stability Of

An in situ TEM observation on the thermal stability of a nanocrystalline FeBSi alloy

1993 ◽  
Vol 16 (5) ◽  
pp. 260-264 ◽  
Author(s):  
H.Y. Tong ◽  
B.Z. Ding ◽  
H.G. Jiang ◽  
Z.Q. Hu ◽  
L. Dong ◽  
...  
Keyword(s):  
Thermal Stability ◽  
In Situ Tem ◽  
Thermal Stability Of

In-Situ Annealing Study on the Thermal Stability of Nickel Germanides

2007 ◽  
Vol 50 (3) ◽  
pp. 677 ◽  
Author(s):  
Jae-Wook Jae-Wook ◽  
Kyung-Hwan Kyung-Hwan ◽  
Hyoungsub Hyoungsub ◽  
Cheol-Woong Cheol-Woong ◽  
Dongwon Dongwon ◽  
...  
Keyword(s):  
Thermal Stability ◽  
Nickel Germanides ◽  
Annealing Study ◽  
Thermal Stability Of

scholarly journals Thermal Stability of Octadecyltrichlorosilane and Perfluorooctyltriethoxysilane Monolayers on SiO2

Nanomaterials ◽  
2020 ◽  
Vol 10 (2) ◽  
pp. 210
Author(s):  
Xiangdong Yang ◽  
Haitao Wang ◽  
Peng Wang ◽  
Xuxin Yang ◽  
Hongying Mao
Keyword(s):  
Thermal Stability ◽  
Thermal Behavior ◽  
Work Function ◽  
Photoelectron Spectroscopy ◽  
Vacuum Annealing ◽  
Moderate Temperature ◽  
Ultraviolet Photoelectron Spectroscopy ◽  
X Ray ◽  
Thermal Stability Of

Using in situ ultraviolet photoelectron spectroscopy (UPS) and X-ray photoelectron spectroscopy (XPS) measurements, the thermal behavior of octadecyltrichlorosilane (OTS) and 1H, 1H, 2H, and 2H-perfluorooctyltriethoxysilane (PTES) monolayers on SiO2 substrates has been investigated. OTS is thermally stable up to 573 K with vacuum annealing, whereas PTES starts decomposing at a moderate temperature between 373 K and 423 K. Vacuum annealing results in the decomposition of CF3 and CF2 species rather than desorption of the entire PTES molecule. In addition, our UPS results reveal that the work function (WF)of OTS remains the same after annealing; however WF of PTES decreases from ~5.62 eV to ~5.16 eV after annealing at 573 K.

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