Plasmonic characteristics of niobium nitride thin films modulated by assisting ions

2021 ◽  
Vol 24 ◽  
pp. 101024
Author(s):  
Chang Gao ◽  
Yujing Ran ◽  
Qian Guo ◽  
Tianrun Wang ◽  
Huiping Lu ◽  
...  
Keyword(s):  
2021 ◽  
Vol 551 ◽  
pp. 149333
Author(s):  
T. Roch ◽  
M. Gregor ◽  
S. Volkov ◽  
M. Čaplovičová ◽  
L. Satrapinskyy ◽  
...  

2012 ◽  
Vol 1424 ◽  
Author(s):  
M. A. Mamun ◽  
A. H. Farha ◽  
Y. Ufuktepe ◽  
H. E. Elsayed-Ali ◽  
A. A. Elmustafa

ABSTRACTNanomechanical and structural properties of pulsed laser deposited niobium nitride thin films were investigated using X-ray diffraction, atomic force microscopy, and nanoindentation. NbN film reveals cubic δ-NbN structure with the corresponding diffraction peaks from the (111), (200), and (220) planes. The NbN thin films depict highly granular structure, with a wide range of grain sizes that range from 15-40 nm with an average surface roughness of 6 nm. The average modulus of the film is 420±60 GPa, whereas for the substrate the average modulus is 180 GPa, which is considered higher than the average modulus for Si reported in the literature due to pile-up. The hardness of the film increases from an average of 12 GPa for deep indents (Si substrate) measured using XP CSM and load control (LC) modes to an average of 25 GPa measured using the DCM II head in CSM and LC modules. The average hardness of the Si substrate is 12 GPa.


2022 ◽  
Vol 123 ◽  
pp. 111879
Author(s):  
Xuepei Wang ◽  
Zhengang Wu ◽  
Yingna Wei ◽  
Mingming Wu ◽  
Ying Chen ◽  
...  
Keyword(s):  
Sol Gel ◽  

2013 ◽  
Vol 13 (2) ◽  
pp. 330-332 ◽  
Author(s):  
R. Baskaran ◽  
A.V. ThanikaiAr ◽  
G. Chinnamma ◽  
M.P. Janawadkar

Author(s):  
V V Merie ◽  
M S Pustan ◽  
G Negrea ◽  
C J Bîrleanu ◽  
H G Crişan

2012 ◽  
Vol 26 (2) ◽  
pp. 025008 ◽  
Author(s):  
Mario Ziegler ◽  
Ludwig Fritzsch ◽  
Julia Day ◽  
Sven Linzen ◽  
Solveig Anders ◽  
...  

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