The properties of TiN thin films deposited by pulsed direct current magnetron sputtering

2008 ◽  
Vol 516 (21) ◽  
pp. 7294-7298 ◽  
Author(s):  
Tung-Sheng Yeh ◽  
Jenn-Ming Wu ◽  
Long-Jang Hu
Keyword(s):  
Thin Films ◽  
Magnetron Sputtering ◽  
Direct Current ◽  
Direct Current Magnetron Sputtering ◽  
Tin Thin Films ◽  
Pulsed Direct Current

scholarly journals Dielectric breakdown of alumina thin films produced by pulsed direct current magnetron sputtering

2018 ◽  
Vol 662 ◽  
pp. 145-154 ◽  
Author(s):  
Benjamin V.T. Hanby ◽  
Bryan W. Stuart ◽  
Colin Grant ◽  
Jonathan Moffat ◽  
Jonathan Blissett ◽  
...  
Keyword(s):  
Thin Films ◽  
Magnetron Sputtering ◽  
Direct Current ◽  
Dielectric Breakdown ◽  
Direct Current Magnetron Sputtering ◽  
Pulsed Direct Current

A New Solar Selective Absorbing Structure of Al-Al2O3 Cermet Composite Films by Pulsed Direct Current Magnetron Sputtering

2008 ◽  
Vol 53-54 ◽  
pp. 349-353 ◽  
Author(s):  
Li Wei Zhu ◽  
Yu Dong Feng ◽  
Y. Wang ◽  
Z.M. Wang ◽  
K. Zhao ◽  
...  
Keyword(s):  
Thin Films ◽  
Magnetron Sputtering ◽  
Direct Current ◽  
Composite Films ◽  
Metal Distribution ◽  
Dc Magnetron Sputtering ◽  
Thermal Emittance ◽  
Direct Current Magnetron Sputtering ◽  
Pulsed Direct Current

Thin films composed of mixtures of metals and dielectric are being considered for use as solar selective coatings for a various applications. By controlling the metal distribution, the solar selective coatings can be designed to have the combined properties of high absorptance, and low infrared emittance. We have studied the preparation of the Al-Al2O3 cermet composite films deposited on the flexible Kapton substrate by pulsed direct current (DC) magnetron sputtering technique. The complex films include infrared reflective layers, interference absorptive layers, and anti-reflective layers. The measurements of the samples show that the spectral absorptance in the region of 0.2~2.5μm and thermal emittance in the region of 2.5~25μm were 92% and 7%, respectively.

Effects of Continuous and Discontinuous Deposition Time in Reactive Direct Current Magnetron Sputtering of Titanium Dioxide Thin Films

2015 ◽  
Vol 1131 ◽  
pp. 251-254
Author(s):  
Montri Aiempanakit ◽  
Chantana Salawan ◽  
Kamon Aiempanakit
Keyword(s):  
Thin Films ◽  
Grain Size ◽  
Surface Morphology ◽  
Magnetron Sputtering ◽  
Direct Current ◽  
Deposition Time ◽  
Spherical Shape ◽  
Contact Angles ◽  
Water Contact ◽  
Direct Current Magnetron Sputtering

The effect of continuous and discontinuous deposition time on the properties of TiO2 thin films deposited by reactive direct current magnetron sputtering (DCMS) on glass substrates was investigated. The deposition processes were designed for a condition of continuous deposition time D1 (60 min) and three conditions of discontinuous deposition time D2 (30 min × 2 times), D3 (15 min × 4 times), and D4 (1 min × 60 times). The crystal structure, surface morphology, and hydrophilicity of TiO2 thin films were characterized by X-ray diffraction, atomic force microscope, and water contact angle method, respectively. It was found that the increasing of discontinuous deposition time (conditions from D1 to D4) shows the changing of grain size from big grain size with spherical shape to small grain size with oval shape. The crystallinity of TiO2 films decrease with increasing the discontinuous deposition time. The water contact angles also decrease as a function of increasing discontinuous deposition time. These results may be explained from the accumulation of heat on the substrate which affected the phase composition and surface morphology of TiO2 thin films.

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