STM and DFT Study of Chlorine Adsorption on the Ag(111)-p(4 × 4)–O Surface

2018 ◽  
Vol 122 (50) ◽  
pp. 28862-28867 ◽  
Author(s):  
Boris V. Andryushechkin ◽  
Vladimir M. Shevlyuga ◽  
Tatiana V. Pavlova ◽  
Georgy M. Zhidomirov ◽  
Konstantin N. Eltsov
2015 ◽  
Vol 639 ◽  
pp. 7-12 ◽  
Author(s):  
B.V. Andryushechkin ◽  
V.V. Zheltov ◽  
V.V. Cherkez ◽  
G.M. Zhidomirov ◽  
A.N. Klimov ◽  
...  

2014 ◽  
Vol 130 ◽  
pp. 453-463 ◽  
Author(s):  
Igor A. Pašti ◽  
Nemanja M. Gavrilov ◽  
Slavko V. Mentus

2009 ◽  
Author(s):  
Manuel Fernández-Gómez ◽  
Amparo Navarro ◽  
MªPaz Fernández-Liencres ◽  
Mónica Moral ◽  
José Manuel Granadino-Roldán ◽  
...  

1991 ◽  
Vol 223 ◽  
Author(s):  
Richard B. Jackman ◽  
Glenn C. Tyrrell ◽  
Duncan Marshall ◽  
Catherine L. French ◽  
John S. Foord

ABSTRACTThis paper addresses the issue of chlorine adsorption on GaAs(100) with respect to the mechanisms of thermal and ion-enhanced etching. The use of halogenated precursors eg. dichloroethane is also discussed in regard to chemically assisted ion beam etching (CAIBE).


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