scholarly journals Influence of Ion Source Geometry on the Repeatability of Topographically Guided LAESI-MSI

Author(s):  
Benjamin Bartels ◽  
Aleš Svatoš
Keyword(s):  
Crystals ◽  
2020 ◽  
Vol 10 (9) ◽  
pp. 796
Author(s):  
Saif Ullah Awan ◽  
Danish Hussain ◽  
Syed Rizwan

The understanding of the growth and morphological evolution of nanoclusters with process parameters such as ion source geometry, voltage, current, time, and gas pressure are highly important to achieve their desired sizes, morphology, and concentration. Carbon nanoclusters (0-dimensional) were synthesized using the DC glow discharge technique at different process parameters (such as Ne-gas pressures, current, voltage, etc.) using custom fabricated graphite ion sources of cylindrical and U-shaped geometries. The morphology and density of carbon nanoclusters were studied with an atomic force microscope (AFM) to understand their evolution at different process parameters. The study suggests that the U-shaped hollow cathode ion source produces tiny carbon nanoclusters at greater concentration as compared to the cylindrical cathode. Similarly, the density of tiny nanoclusters enhances greatly with the increasing pressures (e.g., 75 mbar). In addition, the AFM morphology of the nanoclusters shows that they are more agglomerated at relatively lower pressure (e.g., 25 mbar). This may be due to the higher fragmentation of carbon soot with the increasing pressure because of more collisions among gas molecules and carbonaceous species. At controlled and optimized Ne-gas pressures and source geometry, carbon nanoclusters of the desired sizes can be fabricated, which may become promising candidates for nanoscale electronics, optoelectronic, and spintronic devices.


1995 ◽  
Vol 6 (8) ◽  
pp. 656-667 ◽  
Author(s):  
Dietrich Volmer ◽  
Karsten Levsen ◽  
Maarten Honing ◽  
Damia Barceló ◽  
Joaquín Abian ◽  
...  

2012 ◽  
Vol 83 (2) ◽  
pp. 02A307 ◽  
Author(s):  
O. Delferrière ◽  
R. Gobin ◽  
F. Harrault ◽  
S. Nyckees ◽  
Y. Sauce ◽  
...  

Author(s):  
Dudley M. Sherman ◽  
Thos. E. Hutchinson

The in situ electron microscope technique has been shown to be a powerful method for investigating the nucleation and growth of thin films formed by vacuum vapor deposition. The nucleation and early stages of growth of metal deposits formed by ion beam sputter-deposition are now being studied by the in situ technique.A duoplasmatron ion source and lens assembly has been attached to one side of the universal chamber of an RCA EMU-4 microscope and a sputtering target inserted into the chamber from the opposite side. The material to be deposited, in disc form, is bonded to the end of an electrically isolated copper rod that has provisions for target water cooling. The ion beam is normal to the microscope electron beam and the target is placed adjacent to the electron beam above the specimen hot stage, as shown in Figure 1.


Author(s):  
R. Levi-Setti ◽  
J. M. Chabala ◽  
Y. L. Wang

We have shown the feasibility of 20 nm lateral resolution in both topographic and elemental imaging using probes of this size from a liquid metal ion source (LMIS) scanning ion microprobe (SIM). This performance, which approaches the intrinsic resolution limits of secondary ion mass spectrometry (SIMS), was attained by limiting the size of the beam defining aperture (5μm) to subtend a semiangle at the source of 0.16 mr. The ensuing probe current, in our chromatic-aberration limited optical system, was 1.6 pA with Ga+ or In+ sources. Although unique applications of such low current probes have been demonstrated,) the stringent alignment requirements which they imposed made their routine use impractical. For instance, the occasional tendency of the LMIS to shift its emission pattern caused severe misalignment problems.


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