Plasma Enhanced Atomic Layer Deposition of Nickel and Cobalt Phosphate for Lithium Ion Batteries
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A plasma-enhanced ALD process has been developed to deposit nickel phosphate. The process combines a trimethylphosphate (TMP) plasma with an oxygen plasma and nickelocene at a substrate temperature of 300°C....
2016 ◽
Vol 3
(21)
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pp. 1600369
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2014 ◽
Vol 118
(16)
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pp. 8722-8722
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2014 ◽
Vol 247
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pp. 57-69
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2018 ◽
Vol 1
(7)
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pp. 3277-3282
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