Coupling bimetallic Ni-La/MCM-41 catalyst enhanced by Radio frequency (RF) plasma for dry reforming

2022 ◽  
Author(s):  
Junqiang Xu ◽  
Huan Tian ◽  
Kaipeng Chen ◽  
Qiang Zhang ◽  
Yalin Liu ◽  
...  

Controlling nickel particle size and inhibiting coke deposition on the supported catalyst was an enormous challenge. To solve this problem, La-doped nickel-based catalysts using MCM-41 as the support were prepared...

Catalysts ◽  
2020 ◽  
Vol 10 (5) ◽  
pp. 501 ◽  
Author(s):  
Yinming Li ◽  
Zhaojia Wang ◽  
Bo Zhang ◽  
Zhengang Liu ◽  
Tianxue Yang

In this study, Ni nanoparticles supported on renewable porous carbon were prepared using hydrochar as a carbon precursor via in situ formation and self-reduction. The structure properties of the prepared nanocatalysts were characterized by multiple techniques, including XRD, SEM, and HR-TEM, and the dry reforming of methane (DRM) performance of the nanocatalysts in terms of conversion efficiency and reactivity stability was evaluated. The results revealed that the Ni2+ was uniformly anchored on the surface of the hydrochar, and subsequently the Ni nanoparticles were well dispersed in the composite with a diameter of less than 8 nm and had a narrow particle size distribution at a temperature lower than 800 °C. With an increased temperature from 800 to 900 °C, the significant sintering and agglomeration of nickel particles and the transformation from amorphous carbon to graphitic structure were observed in the composite. The nanocatalysts prepared at a temperature of 700 °C (Ni@C-700) and 800 °C (Ni@C-800) exhibited a high reforming conversion rate and catalytic stability of CH4 by CO2 (around 52% for Ni@C-700 and 70% for Ni@C-800 after 800 min of run-time, respectively). As for the composite obtained at 900 (Ni@C-900), the highly graphitic degree was coupled with the significantly increased nickel particle size, and this resulted in a remarkably decreased conversion efficiency. The present study offers a valuable application of the hydrochar and a facile and green approach to prepare highly active and cost-efficient Ni nanoparticles on porous carbons towards the dry reforming of methane.


2012 ◽  
Vol 179 (1) ◽  
pp. 52-60 ◽  
Author(s):  
P. Frontera ◽  
A. Macario ◽  
A. Aloise ◽  
F. Crea ◽  
P.L. Antonucci ◽  
...  

2021 ◽  
Author(s):  
Rajani K. Vijayaraghavan ◽  
Sean Kelly ◽  
David Coates ◽  
Cezar Gaman ◽  
Niall MacGearailt ◽  
...  

Abstract We demonstrate that a passive non-contact diagnostic technique, radio emission spectroscopy (RES), provides a sensitive monitor of currents in a low pressure radio frequency (RF) plasma. A near field magnetic loop antenna was used to capture RF emissions from the plasma without perturbing it. The analysis was implemented for a capacitively coupled RF plasma with an RF supply at a frequency of 13.56 MHz. Real-time measurements are captured in scenarios relevant to contemporary challenges faced during semiconductor fabrication (e.g. window coating and wall disturbance). Exploration of the technique for key equipment parameters including applied RF power, chamber pressure, RF bias frequencies and chamber wall cleanliness shows sensitive and repeatable function. In particular, the induced RES signal was found to vary sensitively to pressure changes and we were able to detect pressure and power variations as low as ~2.5 %/mtorr and ~3.5 %/watt, respectively, during the plasma processing during a trial generic plasma process. Finally, we explored the ability of RES to monitor the operation of a multiple frequency low-pressure RF plasma system (f1 = 2 MHz, f2 = 162 MHz) and intermixing products which suggests strongly that the plasma sheaths are the primary source of this non-linear diode mixing effect.


2016 ◽  
Vol 8 (4) ◽  
pp. 15-27
Author(s):  
ANDREESCU Anna-Maria Theodora ◽  
◽  
TEODORESCU Maximilian-Vlad ◽  
POPESCU Jeni Alina ◽  
VILAG Valeriu-Alexandru ◽  
...  

Author(s):  
Xinyu Chen ◽  
Wei Ding ◽  
Zhiwei Yao ◽  
Na Sun ◽  
Zhimeng Wang ◽  
...  

A Highly dispersed NiMoP phosphide catalyst with an average particle size of 9.1 nm and a carbon content of 53.5 wt% was firstly synthesized by carbothermal route using glucose as...


2020 ◽  
Vol 93 (4) ◽  
pp. 1571-1580 ◽  
Author(s):  
Ngoc Thang Tran ◽  
Quyet Van Le ◽  
Nguyen Van Cuong ◽  
Trinh Duy Nguyen ◽  
Nguyen Huu Huy Phuc ◽  
...  

Crystals ◽  
2019 ◽  
Vol 9 (6) ◽  
pp. 291 ◽  
Author(s):  
Wei-Chun Chen ◽  
Tung-Yuan Yu ◽  
Fang-I Lai ◽  
Hung-Pin Chen ◽  
Yu-Wei Lin ◽  
...  

Hexagonal pyramid-like InN nanocolumns were grown on Si(111) substrates via radio-frequency (RF) metal–organic molecular beam epitaxy (MOMBE) together with a substrate nitridation process. The metal–organic precursor served as a group-III source for the growth of InN nanocolumns. The nitridation of Si(111) under flowing N2 RF plasma and the MOMBE growth of InN nanocolumns on the nitrided Si(111) substrates were investigated along with the effects of growth temperature on the structural, optical, and chemical properties of the InN nanocolumns. Based on X-ray diffraction analysis, highly <0001>-oriented, hexagonal InN nanocolumns were grown on the nitride Si(111) substrates. To evaluate the alignment of arrays, the deviation angles of the InN nanocolumns were measured using scanning electron microscopy. Transmission electron microscopy analysis indicated that the InN nanocolumns were single-phase wurtzite crystals having preferred orientations along the c-axis. Raman spectroscopy confirmed the hexagonal structures of the deposited InN nanocolumns.


2008 ◽  
Vol 80 (9) ◽  
pp. 1919-1930 ◽  
Author(s):  
Gheorghe Dinescu ◽  
Eusebiu R. Ionita

We report on the operation and characteristics of radio frequency (RF) plasma beam sources based on the expansion of the discharge outside of limited spaces with small interelectrode gaps. The appropriate electrode configuration, combined with high mass flow values and appropriate power levels, leads to small- or large-size plasma jets, working stably at low, intermediate, and atmospheric pressures. The sources are promising tools for a wide range of applications in thin film deposition, surface modification, and cleaning, including the case of temperature-sensitive substrates.


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