Work function and thermal stability of Ti1−xAlxNy for dual metal gate electrodes

2002 ◽  
Vol 81 (22) ◽  
pp. 4192-4194 ◽  
Author(s):  
Tae-Ho Cha ◽  
Dae-Gyu Park ◽  
Tae-Kyun Kim ◽  
Se-Aug Jang ◽  
In-Seok Yeo ◽  
...  
Keyword(s):  
Thermal Stability ◽  
Work Function ◽  
Metal Gate Electrodes ◽  
Metal Gate ◽  
Gate Electrodes ◽  
Dual Metal ◽  
Thermal Stability Of

Thermal stability of Hf/sub x/Ta/sub y/N metal gate electrodes for advanced MOS devices

2006 ◽  
Vol 27 (3) ◽  
pp. 148-150 ◽  
Author(s):  
Chin-Lung Cheng ◽  
Kuei-Shu Chang-Liao ◽  
Tzu-Chen Wang ◽  
Tien-Ko Wang ◽  
Howard Chih-Hao Wang
Keyword(s):  
Thermal Stability ◽  
Metal Gate Electrodes ◽  
Metal Gate ◽  
Gate Electrodes ◽  
Mos Devices ◽  
Thermal Stability Of

Influence of oxygen diffusion through capping layers of low work function metal gate electrodes

2006 ◽  
Vol 27 (4) ◽  
pp. 228-230 ◽  
Author(s):  
Bei Chen ◽  
R. Jha ◽  
H. Lazar ◽  
N. Biswas ◽  
Jaehoon Lee ◽  
...  
Keyword(s):  
Work Function ◽  
Oxygen Diffusion ◽  
Metal Gate Electrodes ◽  
Metal Gate ◽  
Gate Electrodes

An Evaluation of Ti-Based Metal Gate Electrodes on Hf-Silicate Dielectrics for Dual-Metal-Gate Applications

2008 ◽  
Vol 11 (4) ◽  
pp. H81 ◽  
Author(s):  
S. Y. Son ◽  
P. Kumar ◽  
J. S. Lee ◽  
H. Cho ◽  
H. S. Jung ◽  
...  
Keyword(s):  
Metal Gate Electrodes ◽  
Metal Gate ◽  
Gate Electrodes ◽  
Dual Metal

Work Function and Effective Oxide Thickness Engineering via Alloying of Metal Gate Electrodes

2019 ◽  
Vol 16 (5) ◽  
pp. 3-10 ◽  
Author(s):  
Jamie Schaeffer ◽  
Mark Raymond ◽  
David Gilmer ◽  
Rich Gregory ◽  
Bill Taylor ◽  
...  
Keyword(s):  
Work Function ◽  
Oxide Thickness ◽  
Metal Gate Electrodes ◽  
Metal Gate ◽  
Gate Electrodes

Bilayer metal gate electrodes with tunable work function: Mechanism and proposed model

2010 ◽  
Vol 107 (6) ◽  
pp. 063710 ◽  
Author(s):  
Ching-Huang Lu ◽  
Gloria M. T. Wong ◽  
Ryan Birringer ◽  
Reinhold Dauskardt ◽  
Michael D. Deal ◽  
...  
Keyword(s):  
Work Function ◽  
Metal Gate Electrodes ◽  
Metal Gate ◽  
Function Mechanism ◽  
Gate Electrodes ◽  
Proposed Model

Effect of nitrogen content in HfxTayN metal gate on work function and thermal stability of advanced metal-oxide-semiconductor devices

2007 ◽  
Vol 90 (13) ◽  
pp. 132101 ◽  
Author(s):  
Ping-Hung Tsai ◽  
Kuei-Shu Chang-Liao ◽  
Tzu-Cheng Wang ◽  
Tien-Ko Wang ◽  
Chuen-Horng Tsai ◽  
...  
Keyword(s):  
Thermal Stability ◽  
Metal Oxide ◽  
Work Function ◽  
Nitrogen Content ◽  
Semiconductor Devices ◽  
Metal Oxide Semiconductor ◽  
Oxide Semiconductor ◽  
Metal Gate ◽  
Thermal Stability Of
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