Effects of high‐flux low‐energy (20–100 eV) ion irradiation during deposition on the microstructure and preferred orientation of Ti0.5Al0.5N alloys grown by ultra‐high‐vacuum reactive magnetron sputtering

F. Adibi; I. Petrov; J. E. Greene; L. Hultman; J.‐E. Sundgren

doi:10.1063/1.353388

Effects of high‐flux low‐energy (20–100 eV) ion irradiation during deposition on the microstructure and preferred orientation of Ti0.5Al0.5N alloys grown by ultra‐high‐vacuum reactive magnetron sputtering

Journal of Applied Physics ◽

10.1063/1.353388 ◽

1993 ◽

Vol 73 (12) ◽

pp. 8580-8589 ◽

Cited By ~ 134

Author(s):

F. Adibi ◽

I. Petrov ◽

J. E. Greene ◽

L. Hultman ◽

J.‐E. Sundgren

Keyword(s):

Magnetron Sputtering ◽

Ion Irradiation ◽

High Vacuum ◽

Preferred Orientation ◽

Low Energy ◽

Reactive Magnetron Sputtering ◽

Ultra High Vacuum ◽

High Flux ◽

Reactive Magnetron

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Epitaxial growth of metastable δ-TaN layers on MgO(001) using low-energy, high-flux ion irradiation during ultrahigh vacuum reactive magnetron sputtering

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.1513639 ◽

2002 ◽

Vol 20 (6) ◽

pp. 2007 ◽

Cited By ~ 32

Author(s):

C.-S. Shin ◽

Y.-W. Kim ◽

N. Hellgren ◽

D. Gall ◽

I. Petrov ◽

...

Keyword(s):

Magnetron Sputtering ◽

Epitaxial Growth ◽

Ion Irradiation ◽

Ultrahigh Vacuum ◽

Low Energy ◽

Reactive Magnetron Sputtering ◽

High Flux ◽

Reactive Magnetron

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High‐flux low‐energy (≂20 eV) N+2ion irradiation during TiN deposition by reactive magnetron sputtering: Effects on microstructure and preferred orientation

Journal of Applied Physics ◽

10.1063/1.359720 ◽

1995 ◽

Vol 78 (9) ◽

pp. 5395-5403 ◽

Cited By ~ 193

Author(s):

L. Hultman ◽

J.‐E. Sundgren ◽

J. E. Greene ◽

D. B. Bergstrom ◽

I. Petrov

Keyword(s):

Magnetron Sputtering ◽

Preferred Orientation ◽

Low Energy ◽

Reactive Magnetron Sputtering ◽

High Flux ◽

Reactive Magnetron

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Low‐energy (∼100 eV) ion irradiation during growth of TiN deposited by reactive magnetron sputtering: Effects of ion flux on film microstructure

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.577428 ◽

1991 ◽

Vol 9 (3) ◽

pp. 434-438 ◽

Cited By ~ 148

Author(s):

L. Hultman ◽

W.‐D. Münz ◽

J. Musil ◽

S. Kadlec ◽

I. Petrov ◽

...

Keyword(s):

Magnetron Sputtering ◽

Ion Irradiation ◽

Ion Flux ◽

Low Energy ◽

Reactive Magnetron Sputtering ◽

Reactive Magnetron ◽

Film Microstructure

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In situ scanning tunneling microscopy studies of the evolution of surface morphology and microstructure in epitaxial TiN(001) grown by ultra-high-vacuum reactive magnetron sputtering

Surface and Coatings Technology ◽

10.1016/s0257-8972(97)00444-1 ◽

1997 ◽

Vol 94-95 ◽

pp. 403-408 ◽

Cited By ~ 29

Author(s):

Brian W. Karr ◽

I. Petrov ◽

P. Desjardins ◽

David G. Cahill ◽

J.E. Greene

Keyword(s):

Surface Morphology ◽

Magnetron Sputtering ◽

Scanning Tunneling Microscopy ◽

High Vacuum ◽

Reactive Magnetron Sputtering ◽

Ultra High Vacuum ◽

Scanning Tunneling ◽

Reactive Magnetron ◽

Tunneling Microscopy

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Low‐energy ion irradiation during film growth for reducing defect densities in epitaxial TiN(100) films deposited by reactive‐magnetron sputtering

Journal of Applied Physics ◽

10.1063/1.338257 ◽

1987 ◽

Vol 61 (2) ◽

pp. 552-555 ◽

Cited By ~ 96

Author(s):

L. Hultman ◽

U. Helmersson ◽

S. A. Barnett ◽

J.‐E. Sundgren ◽

J. E. Greene

Keyword(s):

Magnetron Sputtering ◽

Film Growth ◽

Ion Irradiation ◽

Low Energy ◽

Reactive Magnetron Sputtering ◽

Reactive Magnetron ◽

Defect Densities

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Development of preferred orientation in polycrystalline NaCl-structure δ-TaN layers grown by reactive magnetron sputtering: Role of low-energy ion surface interactions

Journal of Applied Physics ◽

10.1063/1.1510558 ◽

2002 ◽

Vol 92 (9) ◽

pp. 5084-5093 ◽

Cited By ~ 67

Author(s):

C.-S. Shin ◽

D. Gall ◽

Y.-W. Kim ◽

N. Hellgren ◽

I. Petrov ◽

...

Keyword(s):

Magnetron Sputtering ◽

Surface Interactions ◽

Preferred Orientation ◽

Low Energy ◽

Reactive Magnetron Sputtering ◽

Reactive Magnetron

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Growth of fullerene-like carbon nitride thin solid films by reactive magnetron sputtering; role of low-energy ion irradiation in determining microstructure and mechanical properties

Journal of Applied Physics ◽

10.1063/1.1538316 ◽

2003 ◽

Vol 93 (5) ◽

pp. 3002-3015 ◽

Cited By ~ 76

Author(s):

J. Neidhardt ◽

Zs. Czigány ◽

I. F. Brunell ◽

L. Hultman

Keyword(s):

Mechanical Properties ◽

Magnetron Sputtering ◽

Carbon Nitride ◽

Ion Irradiation ◽

Low Energy ◽

Reactive Magnetron Sputtering ◽

Reactive Magnetron ◽

Thin Solid Films ◽

Solid Films

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Structure and properties of Ti–Si–N films with ∼10 at.% Si deposited using reactive magnetron sputtering with high-flux low-energy ion assistance

Thin Solid Films ◽

10.1016/j.tsf.2007.11.026 ◽

2008 ◽

Vol 516 (19) ◽

pp. 6548-6552 ◽

Cited By ~ 4

Author(s):

Z.G. Li ◽

S. Miyake ◽

M. Makino ◽

Y.X. Wu

Keyword(s):

Magnetron Sputtering ◽

Low Energy ◽

Reactive Magnetron Sputtering ◽

High Flux ◽

Reactive Magnetron ◽

Structure And Properties ◽

Ion Assistance

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Growth of epitaxial TiN films deposited on MgO(100) by reactive magnetron sputtering: The role of low-energy ion irradiation during deposition

Journal of Crystal Growth ◽

10.1016/0022-0248(88)90048-6 ◽

1988 ◽

Vol 92 (3-4) ◽

pp. 639-656 ◽

Cited By ~ 104

Author(s):

L. Hultman ◽

S.A. Barnett ◽

J.-E. Sundgren ◽

J.E. Greene

Keyword(s):

Magnetron Sputtering ◽

Ion Irradiation ◽

Low Energy ◽

Reactive Magnetron Sputtering ◽

Reactive Magnetron ◽

Tin Films

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Preferred orientation and film structure of TaN films deposited by reactive magnetron sputtering

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.1647593 ◽

2004 ◽

Vol 22 (2) ◽

pp. 332-338 ◽

Cited By ~ 14

Author(s):

Suguru Noda ◽

Kun Tepsanongsuk ◽

Yoshiko Tsuji ◽

Yuya Kajikawa ◽

Yoshifumi Ogawa ◽

...

Keyword(s):

Magnetron Sputtering ◽

Film Structure ◽

Preferred Orientation ◽

Reactive Magnetron Sputtering ◽

Reactive Magnetron

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