Source Optimization under Thick Mask Model

2020 International Workshop on Advanced Patterning Solutions (IWAPS) ◽

10.1109/iwaps51164.2020.9286817 ◽

2020 ◽

Author(s):

Yang Liu ◽

Yiyu Sun ◽

Yanqiu Li ◽

Pengzhi Wei ◽

Lihui Liu ◽

...

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