Barrier Lowering-Induced Capacitance Increase of Short-Channel Power p-GaN HEMTs at High Temperature

Author(s):  
Yajie Xin ◽  
Wanjun Chen ◽  
Ruize Sun ◽  
Xiaochuan Deng ◽  
Zhaoji Li ◽  
...  
2001 ◽  
Vol 82 (1-3) ◽  
pp. 238-240 ◽  
Author(s):  
O Breitschädel ◽  
L Kley ◽  
H Gräbeldinger ◽  
J.T Hsieh ◽  
B Kuhn ◽  
...  

2015 ◽  
Vol 55 (9-10) ◽  
pp. 1667-1671 ◽  
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M. Dammann ◽  
M. Baeumler ◽  
P. Brückner ◽  
W. Bronner ◽  
S. Maroldt ◽  
...  

2020 ◽  
Vol 67 (8) ◽  
pp. 3088-3094
Author(s):  
Mojtaba Allaei ◽  
Majid Shalchian ◽  
Farzan Jazaeri

2006 ◽  
Vol 48 (11) ◽  
pp. 2303-2305 ◽  
Author(s):  
M. Werquin ◽  
D. Ducatteau ◽  
N. Vellas ◽  
E. Delos ◽  
Y. Cordier ◽  
...  

1999 ◽  
Vol 35 (23) ◽  
pp. 2018 ◽  
Author(s):  
O. Breitschädel ◽  
H. Gräbeldinger ◽  
B. Kuhn ◽  
F. Scholz ◽  
W. Walthes ◽  
...  
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2000 ◽  
Vol 622 ◽  
Author(s):  
O. Breitschädel ◽  
L. Kley ◽  
H. Gräbeldinger ◽  
B. Kuhn ◽  
F. Scholz ◽  
...  

ABSTRACTWe report on our progress on the fabrication of AlGaN/GaN HEMTs with extremely short gate length. AlGaN/GaN HEMTs with different gate length from 6 νm down to 60nm were fabricated to investigate DC- and high frequency behavior as well as short channel effects. We have found that the transistors with gates in the 100 nm range can be improved in the device performance with respect to transconductance and high frequency but shows also short channel effects as the loss of saturation in the output characteristics and a strong dependency of the threshold voltage on the gate length.


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