Wettability and thermal stability of fluorocarbon films deposited by deep reactive ion etching

2005 ◽  
Vol 23 (3) ◽  
pp. 434-439 ◽  
Author(s):  
Yan Xin Zhuang ◽  
Aric Menon
Keyword(s):  
Thermal Stability ◽  
Reactive Ion Etching ◽  
Ion Etching ◽  
Deep Reactive Ion Etching ◽  
Fluorocarbon Films ◽  
Thermal Stability Of

Fluorocarbon Films Deposited by Deep Reactive Ion Etching for Stiction Minimization of MEMS Structures

2005 ◽  
Author(s):  
Yan Xin Zhuang ◽  
Aric K. Menon
Keyword(s):  
Thermal Stability ◽  
Contact Angle ◽  
Surface Energy ◽  
Reactive Ion Etching ◽  
Adhesive Force ◽  
Measuring System ◽  
Ion Etching ◽  
Deep Reactive Ion Etching ◽  
Fluorocarbon Films ◽  
Nano Scale

Fluorocarbon films, which can be used to minimize stiction of silicon microstructures, have been deposited by passivation process in deep reactive ion etching tool. The wettability, surface energy, nano-scale adhesive force, and thermal stability have been investigated by contact angle measuring system, atomic force microscopy (AFM) and ellipsometry. The fluorocarbon films are good for anti-stiction applications due to their high water contact angle (110°), low surface energy (14.5mJ/m2), low nano-scale adhesive force (33 nN) and high thermal stability up to 300°C.

Streamlined cryogenic deep reactive ion etching protocol for hybrid micronozzle arrays

2011 ◽  
Vol 21 (10) ◽  
pp. 105001
Author(s):  
Ahmet Erten ◽  
Milan Makale ◽  
Xuekun Lu ◽  
Bernd Fruhberger ◽  
Santosh Kesari ◽  
...  
Keyword(s):  
Reactive Ion Etching ◽  
Ion Etching ◽  
Deep Reactive Ion Etching

scholarly journals Correction to Ultrahigh Resolution Titanium Deep Reactive Ion Etching

2017 ◽  
Vol 9 (27) ◽  
pp. 23263-23263
Author(s):  
Bryan W. K. Woo ◽  
Shannon C. Gott ◽  
Ryan A. Peck ◽  
Dong Yan ◽  
Mathias W. Rommelfanger ◽  
...  
Keyword(s):  
Reactive Ion Etching ◽  
Ultrahigh Resolution ◽  
Ion Etching ◽  
Deep Reactive Ion Etching

Deep reactive ion etching of sub-micrometer trenches with ultra high aspect ratio

2014 ◽  
Vol 113 ◽  
pp. 35-39 ◽  
Author(s):  
Jayalakshmi Parasuraman ◽  
Anand Summanwar ◽  
Frédéric Marty ◽  
Philippe Basset ◽  
Dan E. Angelescu ◽  
...  
Keyword(s):  
Aspect Ratio ◽  
High Aspect Ratio ◽  
Reactive Ion Etching ◽  
Ion Etching ◽  
Deep Reactive Ion Etching

Modeling and simulation of the lag effect in a deep reactive ion etching process

2006 ◽  
Vol 16 (12) ◽  
pp. 2570-2575 ◽  
Author(s):  
Yiyong Tan ◽  
Rongchun Zhou ◽  
Haixia Zhang ◽  
Guizhang Lu ◽  
Zhihong Li
Keyword(s):  
Modeling And Simulation ◽  
Reactive Ion Etching ◽  
Etching Process ◽  
Ion Etching ◽  
Deep Reactive Ion Etching ◽  
Lag Effect
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