Growth of flat-topped, mound-shaped grains with voids when depositing silver thin films at high substrate temperatures using direct-current magnetron sputtering

2022 ◽  
Vol 40 (1) ◽  
pp. 013410
Author(s):  
Eiji Kusano
Keyword(s):  
Thin Films ◽  
Magnetron Sputtering ◽  
Direct Current ◽  
High Substrate ◽  
Direct Current Magnetron Sputtering ◽  
Silver Thin Films ◽  
Substrate Temperatures

Effects of Continuous and Discontinuous Deposition Time in Reactive Direct Current Magnetron Sputtering of Titanium Dioxide Thin Films

2015 ◽  
Vol 1131 ◽  
pp. 251-254
Author(s):  
Montri Aiempanakit ◽  
Chantana Salawan ◽  
Kamon Aiempanakit
Keyword(s):  
Thin Films ◽  
Grain Size ◽  
Surface Morphology ◽  
Magnetron Sputtering ◽  
Direct Current ◽  
Deposition Time ◽  
Spherical Shape ◽  
Contact Angles ◽  
Water Contact ◽  
Direct Current Magnetron Sputtering

The effect of continuous and discontinuous deposition time on the properties of TiO2 thin films deposited by reactive direct current magnetron sputtering (DCMS) on glass substrates was investigated. The deposition processes were designed for a condition of continuous deposition time D1 (60 min) and three conditions of discontinuous deposition time D2 (30 min × 2 times), D3 (15 min × 4 times), and D4 (1 min × 60 times). The crystal structure, surface morphology, and hydrophilicity of TiO2 thin films were characterized by X-ray diffraction, atomic force microscope, and water contact angle method, respectively. It was found that the increasing of discontinuous deposition time (conditions from D1 to D4) shows the changing of grain size from big grain size with spherical shape to small grain size with oval shape. The crystallinity of TiO2 films decrease with increasing the discontinuous deposition time. The water contact angles also decrease as a function of increasing discontinuous deposition time. These results may be explained from the accumulation of heat on the substrate which affected the phase composition and surface morphology of TiO2 thin films.

scholarly journals Hall mobility of cuprous oxide thin films deposited by reactive direct-current magnetron sputtering

2011 ◽  
Vol 98 (19) ◽  
pp. 192115 ◽  
Author(s):  
Yun Seog Lee ◽  
Mark T. Winkler ◽  
Sin Cheng Siah ◽  
Riley Brandt ◽  
Tonio Buonassisi
Keyword(s):  
Thin Films ◽  
Magnetron Sputtering ◽  
Direct Current ◽  
Hall Mobility ◽  
Cuprous Oxide ◽  
Oxide Thin Films ◽  
Direct Current Magnetron Sputtering

Optical properties of aluminum nitride thin films grown by direct-current magnetron sputtering close to epitaxy

2013 ◽  
Vol 534 ◽  
pp. 442-445 ◽  
Author(s):  
A. Stolz ◽  
A. Soltani ◽  
B. Abdallah ◽  
J. Charrier ◽  
D. Deresmes ◽  
...  
Keyword(s):  
Thin Films ◽  
Optical Properties ◽  
Aluminum Nitride ◽  
Magnetron Sputtering ◽  
Direct Current ◽  
Direct Current Magnetron Sputtering

Deposition and Characterization of Cuprous Oxide Thin Films by Direct Current Magnetron Sputtering

2015 ◽  
Vol 7 (11) ◽  
pp. 990-994
Author(s):  
V. Vignesh ◽  
R. Niveditha ◽  
R. Nirmala ◽  
R.T. Rajendrakumar ◽  
R. Navamathavan
Keyword(s):  
Thin Films ◽  
Magnetron Sputtering ◽  
Direct Current ◽  
Cuprous Oxide ◽  
Oxide Thin Films ◽  
Direct Current Magnetron Sputtering

scholarly journals Reactive sputtering of δ-ZrH2 thin films by high power impulse magnetron sputtering and direct current magnetron sputtering

2014 ◽  
Vol 32 (4) ◽  
pp. 041510 ◽  
Author(s):  
Hans Högberg ◽  
Lina Tengdelius ◽  
Mattias Samuelsson ◽  
Fredrik Eriksson ◽  
Esteban Broitman ◽  
...  
Keyword(s):  
Thin Films ◽  
Magnetron Sputtering ◽  
Direct Current ◽  
High Power ◽  
Reactive Sputtering ◽  
Direct Current Magnetron Sputtering
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