Strong Influence of Surface Structures on Enhanced Transmission through Subwavelength Hole Arrays

2005 ◽  
Vol 44 (No. 30) ◽  
pp. L973-L975 ◽  
Author(s):  
Kunihiko Ishihara ◽  
Keishi Ohashi
2010 ◽  
Author(s):  
Mei Sun ◽  
Peiyuan Guo ◽  
Suxia Xing ◽  
Hongbing Xiao ◽  
Degang Xu

2006 ◽  
Vol 89 (12) ◽  
pp. 121115 ◽  
Author(s):  
F. Przybilla ◽  
C. Genet ◽  
T. W. Ebbesen

2013 ◽  
Vol 15 (1) ◽  
pp. 013003 ◽  
Author(s):  
M Navarro-Cía ◽  
Pablo Rodriguez-Ulibarri ◽  
M Beruete

2006 ◽  
Vol 23 (2) ◽  
pp. 486-488 ◽  
Author(s):  
Sun Mei ◽  
Tian Jie ◽  
Li Zhi-Yuan ◽  
Cheng Bing-Ying ◽  
Zhang Dao-Zhong ◽  
...  

2021 ◽  
Author(s):  
Chun Li ◽  
Ling Jiang ◽  
Qingxiao Ma ◽  
Yan Teng ◽  
Rui Bian ◽  
...  

2010 ◽  
Vol 35 (13) ◽  
pp. 2124 ◽  
Author(s):  
Z. Marcet ◽  
Z. H. Hang ◽  
C. T. Chan ◽  
I. Kravchenko ◽  
J. E. Bower ◽  
...  

2006 ◽  
Vol 15 (7) ◽  
pp. 1591-1594 ◽  
Author(s):  
Sun Mei ◽  
Liu Rong-Juan ◽  
Li Zhi-Yuan ◽  
Cheng Bing-Ying ◽  
Zhang Dao-Zhong ◽  
...  

2006 ◽  
Vol 38 (2) ◽  
pp. 117-123 ◽  
Author(s):  
Z. Jaksic ◽  
M. Maksimovic ◽  
D. Vasiljevic-Radovic ◽  
M. Sarajlic

Owing to their surface plasmon-based operation, arrays of subwavelength holes show extraordinary electromagnetic transmission and intense field localizations of several orders of magnitude. Thus they were proposed as the basic building blocks for a number of applications utilizing the enhancement of nonlinear optical effects. We designed and simulated nanometer-sized subwavelength holes using an analytical approach. In our experiments we used the scanning probe method for nanolithographic fabrication of subwavelength hole arrays in silver layers sputtered on a positive photoresist substrate. We fabricated ordered nanohole patterns with different shapes, dispositions and proportions. The smallest width was about 60 nm. We characterized the fabricated samples by atomic force microscopy.


2020 ◽  
Vol 10 (8) ◽  
pp. 2966 ◽  
Author(s):  
Yun-Ying Yeh ◽  
Chih-Hsiung Shen ◽  
Chi-Feng Chen

The infrared absorption efficiency (IAE) enhancement of the complementary-metal-oxide-semiconductorCMOS compatible thermopile with special subwavelength hole arrays in an active area was numerically investigated by the finite-difference time-domain method. It was found that the absorption efficiency of that thermopile was enhanced when the subwavelength rectangular-hole array added extra rectangular-columnar or ellipse-columnar structures in the hole array. The simulation results show that the IAEs of the better cases for the three types of rectangular columns and three ellipse columns were increased by 14.4% and 15.2%, respectively. Such special subwavelength hole arrays can be improved by the IAE of the CMOS compatible thermopile.


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