MOCVD of CeO2 and SiO2 Mixture Films Using Alkoxy Sources

ECS Solid State Letters ◽

10.1149/2.0041512ssl ◽

2015 ◽

Vol 4 (12) ◽

pp. N17-N19 ◽

Author(s):

T. Matsumura ◽

T. Furuya ◽

T. Sato ◽

Y. Okabe ◽

S. Suzuki ◽

...

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