scholarly journals High speed ultrafast laser anisotropic nanostructuring by energy deposition control via near-field enhancement

Optica ◽  
2021 ◽  
Author(s):  
Yuhao Lei ◽  
Masaaki Sakakura ◽  
Lei Wang ◽  
Yan-Hao Yu ◽  
Huijun Wang ◽  
...  
ACS Photonics ◽  
2018 ◽  
Vol 5 (4) ◽  
pp. 1418-1426 ◽  
Author(s):  
Xxx Sedao ◽  
Anthony Abou Saleh ◽  
Anton Rudenko ◽  
Thierry Douillard ◽  
Claude Esnouf ◽  
...  

Nanophotonics ◽  
2020 ◽  
Vol 9 (7) ◽  
pp. 2097-2105
Author(s):  
Xiaozhuo Qi ◽  
Tsz Wing Lo ◽  
Di Liu ◽  
Lantian Feng ◽  
Yang Chen ◽  
...  

AbstractPlasmonic nanocavities comprised of metal film-coupled nanoparticles have emerged as a versatile nanophotonic platform benefiting from their ultrasmall mode volume and large Purcell factors. In the weak-coupling regime, the particle-film gap thickness affects the photoluminescence (PL) of quantum emitters sandwiched therein. Here, we investigated the Purcell effect-enhanced PL of monolayer MoS2 inserted in the gap of a gold nanoparticle (AuNP)–alumina (Al2O3)–gold film (Au Film) structure. Under confocal illumination by a 532 nm CW laser, we observed a 7-fold PL peak intensity enhancement for the cavity-sandwiched MoS2 at an optimal Al2O3 thickness of 5 nm, corresponding to a local PL enhancement of ∼350 by normalizing the actual illumination area to the cavity’s effective near-field enhancement area. Full-wave simulations reveal a counterintuitive fact that radiation enhancement comes from the non-central area of the cavity rather than the cavity center. By scanning an electric dipole across the nanocavity, we obtained an average radiation enhancement factor of about 65 for an Al2O3 spacer thickness of 4 nm, agreeing well with the experimental thickness and indicating further PL enhancement optimization. Our results indicate the importance of configuration optimization, emitter location and excitation condition when using such plasmonic nanocavities to modulate the radiation properties of quantum emitters.


2021 ◽  
Vol 12 (1) ◽  
Author(s):  
Nantao Li ◽  
Taylor D. Canady ◽  
Qinglan Huang ◽  
Xing Wang ◽  
Glenn A. Fried ◽  
...  

AbstractInterferometric scattering microscopy is increasingly employed in biomedical research owing to its extraordinary capability of detecting nano-objects individually through their intrinsic elastic scattering. To significantly improve the signal-to-noise ratio without increasing illumination intensity, we developed photonic resonator interferometric scattering microscopy (PRISM) in which a dielectric photonic crystal (PC) resonator is utilized as the sample substrate. The scattered light is amplified by the PC through resonant near-field enhancement, which then interferes with the <1% transmitted light to create a large intensity contrast. Importantly, the scattered photons assume the wavevectors delineated by PC’s photonic band structure, resulting in the ability to utilize a non-immersion objective without significant loss at illumination density as low as 25 W cm−2. An analytical model of the scattering process is discussed, followed by demonstration of virus and protein detection. The results showcase the promise of nanophotonic surfaces in the development of resonance-enhanced interferometric microscopies.


electromagnetic field at the particl e has to be computed numerically. An example of such a computation using a program based on [49] is given in Fig. 4. But not only doe s the Mie theory describe an enhancement of the laser intensity in the particles' near field, it also predicts that for certain values of the size parameter nd/X (d denoting the particle diameter, À the laser wavelength) the enhancement should be particularly efficient, resulting in a resonant intensity enhancement, the so-called "Mie-resonances". 3.2.2. Near-field induced substrate damage When inspecting contaminated samples by scanning electron microscopy (SEM) or atomic force microscopy (AFM ) after DLC using ns laser pulses, the consequences of the field enhancement process became obvious: all over the cleaned areas w e found substrate damages localized exactly at the former particle positions [35, 37-39]. These damages manifested as melting pools or even holes in the surface, typical examples can be seen in Fig. 5. The consequences for the laser cleaning process are obvious. The intensity enhancement reduces the maximum laser fluence that can be applied in the process. Usually in laser cleaning studies [19, 31 ] the laser fluence corresponding to the melting threshold of a bare surface is taken as the damage threshold fluence. Our experiments show clearly that this is an inadequate definition. Instead one must take into account the enhanced laser fluence underneath the particles, as it will be discussed in Section 4. Fro m the obtained AFM images we were able to analyse in detail the surface profile at the damaged sites. Here we found that for high field enhancement factors the silicon substrate was not only molten , but that some material was even ablated (see Sec. 4). The momentum transfer to the particles during the ablation process significantly contributes to the cleanin g process and hence local substrate ablation

2003 ◽  
pp. 327-330

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