Mechanism of hole inlet closure in shape transformation of hole arrays on Si(001) substrates by hydrogen annealing

2011 ◽  
Vol 1299 ◽  
Author(s):  
Reiko Hiruta ◽  
Hitoshi Kuribayashi ◽  
Koichi Sudoh ◽  
Ryosuke Shimizu

ABSTRACTWe investigated the process of the hole inlet closure in surface-diffusion-driven transformation of arrays of high-aspect-ratio holes on Si(001) substrates. The inlet gradually shrinks while keeping the circular shape because of lateral bulging of the inlet surface. We observed complicated top view morphologies reflecting the four-fold symmetry of the Si(001) surface on the inlet surface. Large {111} and {113} facets are formed in the four equivalent azimuths of the [110], while corrugated patterns arise in the four equivalent azimuths of the [100]. Atomic force microscopy observations reveal that the corrugated pattern is composed of three types of small facets, namely, {110} and two {113} in relation of the mirror symmetry. The corrugated pattern formation is due to the geometrical restriction that there is no stable facet between (001) and (010) in the [010] azimuth. The observed morphological evolution is interpreted as surface-diffusion-driven transformation under constraint of the anisotropic surface energy of Si.

2006 ◽  
Vol 38 (2) ◽  
pp. 117-123 ◽  
Author(s):  
Z. Jaksic ◽  
M. Maksimovic ◽  
D. Vasiljevic-Radovic ◽  
M. Sarajlic

Owing to their surface plasmon-based operation, arrays of subwavelength holes show extraordinary electromagnetic transmission and intense field localizations of several orders of magnitude. Thus they were proposed as the basic building blocks for a number of applications utilizing the enhancement of nonlinear optical effects. We designed and simulated nanometer-sized subwavelength holes using an analytical approach. In our experiments we used the scanning probe method for nanolithographic fabrication of subwavelength hole arrays in silver layers sputtered on a positive photoresist substrate. We fabricated ordered nanohole patterns with different shapes, dispositions and proportions. The smallest width was about 60 nm. We characterized the fabricated samples by atomic force microscopy.


2002 ◽  
Vol 01 (05n06) ◽  
pp. 725-730 ◽  
Author(s):  
M. S. XU ◽  
J. B. XU ◽  
J. AN

Variable temperature tapping mode atomic force microscopy is exploited to in situ visualize the morphological evolution of N, N'-di(naphthalene-1-yl)-N, N'-diphthalbenzidine (NPB) thin film. The apparent glass transition of the NPB thin film initially occurred at 60°C, proceeded until 95°C, and crystallization from the glassy state quickly appeared at 135°C. The NPB thin film gradually melted and disappeared when the temperature was above 175°C, revealing the underlying layer. These observations are technically helpful and significant to gauge the temperature dependent lifetime and luminance of organic light-emitting diodes.


1994 ◽  
Vol 367 ◽  
Author(s):  
Tomoyasu Inoue ◽  
Yasuhiro Yamamoto ◽  
Masataka Satoh ◽  
Tetsu Ohsuna

AbstractSurface morphology evolution of epitaxially grown CeO2(110) layers on Si(100) substrates is studied using atomic force microscopy (AFM) and reflection high energy electron diffraction (RHEED). The surface has a faceted structure; a stripe-appearance and triangular-shape in plan- and cross-sectional views, respectively. AFM measurements clarify that as the layer thickness increases, the cross-sectional shape changes from a gable roof shape toward trapezoidal, which is consistent with RHEED analyses. The width of the facet monotonically increases with the layer thickness, while its height saturates at ∼5 nm above 600 nm in thickness, which means that the surface approaches smooth morphology. Ion channeling analyses indicate that the thicker the layer, the better the crystalline quality at the surface.


2013 ◽  
Vol 203-204 ◽  
pp. 86-89 ◽  
Author(s):  
Miroslaw Bramowicz ◽  
Slawomir Kulesza ◽  
Tomasz Lipiński ◽  
Pawel Szabracki ◽  
Pawel Piatkowski

This study discusses changes in the value of fractal parameters determined based on functions of structure S(t), generated in different directions of anisotropy of the examined surfaces. The analyzed material consisted of AFM calibration standards TGT1, PG and TGZ1 which were used as models of strongly isotropic and anisotropic surfaces. The topography of the examined surfaces was imaged by atomic force microscopy. The obtained results indicate that all surfaces can be described mathematically to identify fractal parameters in any anisotropic direction.


Langmuir ◽  
2014 ◽  
Vol 30 (36) ◽  
pp. 10809-10817 ◽  
Author(s):  
Dingzheng Yang ◽  
Lei Xie ◽  
Erin Bobicki ◽  
Zhenghe Xu ◽  
Qingxia Liu ◽  
...  

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