Magnetotransport properties of Co-C granular thin films depending on the carbon sputtering power

2012 ◽  
Vol 1458 ◽  
Author(s):  
J.G Kang ◽  
M. Mizuguchi ◽  
K. Takanashi
Keyword(s):  
Thin Films ◽  
Raman Spectroscopy ◽  
Structural Properties ◽  
Intensity Ratio ◽  
Transport Mechanism ◽  
Variable Range Hopping ◽  
Granular Films ◽  
Si Substrates ◽  
Sputtering Power ◽  
Two Peaks

AbstractCoxC1-x granular films were deposited on Si substrates by a co-sputtering method. A large negative MR of 30.3% was obtained at 2 K for the sample prepared with the sputtering power of 50 W (C) and 4 W (Co). We have studied structural properties of Co-C granular films by Raman spectroscopy. Two peaks (D and G modes) from carbon bonds were clearly observed, and the intensity ratio of two peaks changed with the sputtering power, suggesting that the graphitization was promoted with the sputtering power. It was also revealed that the transport mechanism changed from tunneling to Mott’s variable range hopping and MR decreased with the sputtering power.

Polycrystalline GeC Thin Films Deposited Using a Unique Hollow Cathode Sputtering Technique

2005 ◽  
Vol 862 ◽  
Author(s):  
R. J. Soukup ◽  
N. J. Ianno ◽  
J. S. Schrader ◽  
V. L. Dalal
Keyword(s):  
Thin Films ◽  
Raman Spectroscopy ◽  
Hollow Cathode ◽  
Growth Conditions ◽  
Group Iv ◽  
Native Oxide ◽  
Cathode Sputtering ◽  
Si Substrates ◽  
New Material ◽  
Equilibrium Growth

AbstractExperimental results on thin films of the new material GexC1-x, deposited by a unique dual plasma hollow cathode sputtering technique are presented. The mostimportant contribution of this work is that it shows that by using non-equilibrium growth conditions resulting from the hollow cathode technique, one can grow Group IV materials which cannot otherwise be grown using normal CVD or MBE processes. The sputtering is accomplished by igniting a dc plasma in the Ar and H2 gases which are fed through Ge and C nozzles.The GeC films are grown on etched Si (100), on Si with the native oxide and on glass. The films grown on glass were quite disordered, but the films grown on both types of Si substrates were very ordered in nature. This order has been characterized using Xray diffraction (XRD) and Raman spectroscopy.Films with as much as 8% C have been deposited. In order to produce useful GexC1-x films, the C must bond to the Ge at lattice sites. Evidence of this desired GeC bond has been seen using Fourier Transform Infrared Spectroscopy (FTIR), Raman Spectroscopy, and XRD.

scholarly journals Process Oxygen Flow Influence on the Structural Properties of Thin Films Obtained by Co-Sputtering of (TeO2)x-ZnO and Au onto Si Substrates

Nanomaterials ◽  
2020 ◽  
Vol 10 (9) ◽  
pp. 1863
Author(s):  
Leonardo Bontempo ◽  
Sebastião G. dos Santos Filho ◽  
Luciana R. P. Kassab
Keyword(s):  
Thin Films ◽  
Structural Properties ◽  
Single Phase ◽  
Oxygen Flow ◽  
Oxidizing Agent ◽  
Tellurium Oxide ◽  
Si Substrates ◽  
Β Phase ◽  
Α Phase ◽  
Electrochemical Mechanism

In this study, we investigated the structural properties of TeO2-ZnO (TZ) and TeO2-ZnO-Au (TZA) thin films sputtered under different oxygen concentrations and either annealed or not annealed at 325 °C in air for 10 or 20 h. The lattice changes of the tellurium oxide were shown to be inherent in the polymorph properties of the α and β phases. The β phase was formed for null oxygen flow and the α phase was formed for different oxygen flows (0.5–7.0 sccm) during TZ and TZA sputtering. Au was encountered in its single phase or as AuTe2. The annealing had very little influence on the α and β phases for both TZ and TZA. It is worth noting that SiO2 and orthotellurate anions are both formed for not-null oxygen flow. An electrochemical mechanism was proposed to explain the SiO2 growth at the TZ/Si or TZA/Si interface, taking the orthotellurate anion as oxidizing agent into account.

Sensitivity of ZnO Based NH3 Sensor by RF Magnetron Sputtering

2012 ◽  
Vol 626 ◽  
pp. 168-172
Author(s):  
Samsiah Ahmad ◽  
Nor Diyana Md Sin ◽  
M.N. Berhan ◽  
Mohamad Rusop
Keyword(s):  
Thin Films ◽  
Zinc Oxide ◽  
Magnetron Sputtering ◽  
Radio Frequency ◽  
Structural Properties ◽  
Rf Magnetron Sputtering ◽  
Xrd Analysis ◽  
Zno Thin Films ◽  
Rf Power ◽  
Si Substrates

Zinc Oxide (ZnO) thin films were deposited onto SiO2/Si substrates using radio frequency (RF) magnetron sputtering method as an Ammonia (NH3) sensor. The dependence of RF power (50~300 Watt) on the structural properties and sensitivity of NH3sensor were investigated. XRD analysis shows that regardless of the RF power, all samples display the preferred orientation on the (002) plane. The results show that the ZnO deposited at 200 Watt display the highest sensitivity value which is 44%.

Magnetic and structural properties of BiFeO3 thin films grown epitaxially on SrTiO3/Si substrates

2013 ◽  
Vol 113 (17) ◽  
pp. 17D919 ◽  
Author(s):  
Ryan P. Laughlin ◽  
Daniel A. Currie ◽  
Rocio Contreras-Guererro ◽  
Aruna Dedigama ◽  
Weerasinghe Priyantha ◽  
...  
Keyword(s):  
Thin Films ◽  
Structural Properties ◽  
Si Substrates ◽  
Bifeo3 Thin Films

scholarly journals Magnetron sputtering technique for analyzing the influence of RF sputtering power on microstructural surface morphology of aluminum thin films deposited on SiO2/Si substrates

2021 ◽  
Vol 127 (10) ◽  
Author(s):  
Somayeh Asgary ◽  
Elnaz Vaghri ◽  
Masoumeh Daemi ◽  
Parisa Esmaili ◽  
Amir H. Ramezani ◽  
...  
Keyword(s):  
Thin Films ◽  
Magnetron Sputtering ◽  
Rf Sputtering ◽  
Rf Power ◽  
X Ray Diffraction ◽  
X Ray ◽  
Si Substrates ◽  
Sputtering Power ◽  
Microstructural Surface ◽  
Deposited Films

AbstractIn this research, aluminum (Al) thin films were deposited on SiO2/Si substrates using RF magnetron sputtering technique for analyzing the influence of RF sputtering power on microstructural surface morphologies. Different sputtering RF powers (100–400 W) were employed to form Al thin films. The characteristics of deposited Al thin films are investigated using X-ray diffraction pattern (XRD), scanning electron microscopy (SEM), atomic force microscopy (AFM) and Fourier-transforms infrared (FTIR) spectroscopy. The X-ray diffraction (XRD) results demonstrate that the deposited films in low sputtering power have amorphous nature. By increasing the sputtering power, crystallization is observed. AFM analysis results show that the RF power of 300 W is the optimum sputtering power to grow the smoothest Al thin films. FTIR results show that the varying RF power affect the chemical structure of the deposited films. The SEM results show that by increasing the sputtering power leads to the formation of isolated texture on the surface of substrate. In conclusion, RF power has a significant impact on the properties of deposited films, particularly crystallization and shape.

Crystalline and Structural Properties Dependence on RF Power and Deposition Temperature of Sputtered Nanocrystalline Silicon Thin Films on Teflon and Glass Substrates

2012 ◽  
Vol 576 ◽  
pp. 475-479
Author(s):  
Norhidayatul Hikmee Mahzan ◽  
Shaiful Bakhtiar Hashim ◽  
Sukreen Hana Herman ◽  
M. Rusop
Keyword(s):  
Thin Films ◽  
Raman Spectroscopy ◽  
Structural Properties ◽  
Deposition Temperature ◽  
Rf Magnetron Sputtering ◽  
Nanocrystalline Silicon ◽  
Rf Power ◽  
Glass Substrates ◽  
Silicon Thin Films ◽  
Scanning Electron

Nanocrystalline silicon (nc-Si) thin films were deposited on glass and polytetrafluoroethylene (PTFE, teflon) substrates using Radio frequency (RF) magnetron sputtering. The effect of RF power and deposition temperature on the physical and structural properties of nc-Si on the glass and Teflon substrate was studied. The thin films properties were examined by Raman spectroscopy and field emission scanning electron microscopy (FESEM). We found that the thickness of thin films increased with increased RF power and deposition temperature. Raman spectroscopy results it showed that, with increasing RF power and deposition temperature can cause the changing of crystallinity on both glass and Teflon substrate.

Raman spectroscopy and X-ray diffraction study of sol–gel derived (Pb1−xLax)Ti1−x/4O3 thin films on Si substrates

1998 ◽  
Vol 322 (1-2) ◽  
pp. 323-328 ◽  
Author(s):  
Di Wu ◽  
Ai-dong Li ◽  
Chuan-Zhen Ge ◽  
Peng Lü ◽  
Chun-Yi Xu ◽  
...  
Keyword(s):  
Thin Films ◽  
Raman Spectroscopy ◽  
Diffraction Study ◽  
Sol Gel ◽  
X Ray Diffraction ◽  
X Ray ◽  
Si Substrates
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