scholarly journals Effect of Aluminum Doping Ratios on the Properties of Aluminum-Doped Zinc Oxide Films Deposited by Mist Chemical Vapor Deposition Method Applying for Photocatalysis

Nanomaterials ◽  
2022 ◽  
Vol 12 (2) ◽  
pp. 195
Author(s):  
Htet Su Wai ◽  
Chaoyang Li
Keyword(s):  
Zinc Oxide ◽  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Chemical Vapor Deposition Method ◽  
Zinc Oxide Film ◽  
Al Doping ◽  
Aluminum Doping ◽  
Aluminum Doped Zinc Oxide ◽  
Doping Ratio

Aluminum-doped zinc oxide film was deposited on a glass substrate by mist chemical vapor deposition method. The influence of different aluminum doping ratios on the structural and optical properties of zinc oxide film was investigated. The XRD results revealed that the diffraction peak of (101) crystal plane was the dominant peak for the deposited AZO films with the Al doping ratios increasing from 1 wt % to 3 wt %. It was found that the variation of AZO film structures was strongly dependent on the Al/Zn ratios. The intertwined nanosheet structures were obtained when Zn/O ratios were greater than Al/O ratios with the deposition temperature of 400 °C. The optical transmittance of all AZO films was greater than 80% in the visible region. The AZO film deposited with Al doping ratio of 2 wt % showed the highest photocatalytic efficiency between the wavelength of 475 nm and 700 nm, with the high first-order reaction rate of 0.004 min−1 under ultraviolet radiation. The mechanism of the AZO film influenced by aluminum doping ratio during mist chemical vapor deposition process was revealed.

Preparation and Hydrophobic Processing of Aluminum-Doped Zinc Oxide Films

2010 ◽  
Vol 39 ◽  
pp. 44-49 ◽  
Author(s):  
Chen Li ◽  
Min Li ◽  
Du Yao Zhang
Keyword(s):  
Zinc Oxide ◽  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Organic Chemical ◽  
Glass Substrates ◽  
Zinc Oxide Films ◽  
Barrier Discharge Plasma ◽  
Aluminum Doped Zinc Oxide ◽  
Metal Organic

In this research, transparent and conductive aluminum-doped zinc oxide (AZO) films were prepared on glass substrates by metal-organic chemical vapor deposition (MOCVD). A nanostructured hydrophobic layer of fluorocarbon (FC) compounds was formed on the films by low-temperature dielectric barrier discharge plasma enhanced chemical vapor deposition (DBD-PECVD), as hydrophobic processing. Scanning electron microscopy (SEM) and contact angle analyzer were used to characterize and analyze the surface morphology, structure and hydrophobicity of these samples. The results indicate that the hydrophobicity of transparent conductive AZO films was enhanced by the deposition of the FC film.

Preparation of ZnO by a nearby vaporizing chemical vapor deposition method

2003 ◽  
Vol 18 (9) ◽  
pp. 2029-2032 ◽  
Author(s):  
Junichi Nishino ◽  
Yoshio Nosaka
Keyword(s):  
Zinc Oxide ◽  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Source Material ◽  
Chemical Vapor Deposition Method ◽  
Zno Films ◽  
Source Surface ◽  
Deposition Method ◽  
Zno Film

Zinc oxide (ZnO) films were prepared by a nearby vaporizing chemical vapor deposition method using bis(2,4-pentanedionato)zinc as a source material. The deposition rate increased exponentially from 0.58 to 147 nm min−1 with increasing substrate temperature (Ts). The highest preferred orientation to the c axis was obtained under the conditions that the distance between substrate and source surface was 5.0 mm, and the Ts was 300 °C. When we used a sapphire (0001) substrate, an epitaxial ZnO film could be deposited on this condition.

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