Effect of reactive gas condition on nonpolar AlN film growth on MnS/Si (100) by reactive DC sputtering

2022 ◽  
Author(s):  
Masaya Morita ◽  
Keiji Ishibashi ◽  
Kenichiro Takahashi ◽  
Shigenori Ueda ◽  
Jun Chen ◽  
...  
Keyword(s):  
Low Temperature ◽  
Substrate Temperature ◽  
Gas Flow ◽  
Film Growth ◽  
Flow Conditions ◽  
Dc Magnetron Sputtering ◽  
Temperature Growth ◽  
Dc Sputtering ◽  
Aln Film ◽  
Reactive Gas

Abstract The effects of reactive gas flow conditions on nonpolar AlN film growth on MnS/Si　(100) substrates using reactive DC magnetron sputtering were investigated. During AlN deposition at a substrate temperature of 750 °C, the MnS surface can be unintentionally nitrided, resulting in a decrease in the crystallinity of the AlN. Low temperature growth of the AlN layer at 300 °C prevents this nitridation and results in the crystallization of nonpolar AlN. A N2 flow equal to 30% of the Ar sputtering gas flow was found to improve the crystallinity of the nonpolar AlN and to reduce nitrogen defects, which play an important role in interfacial reactions. Nitrogen defects promote the formation of alloys such as AlMn and MnSi that degrade the interface and can significantly decompose the MnS. A higher proportion of N2 improves the nonpolar AlN crystallinity, reduces the concentration of defects and suppresses reactions at the AlN/MnS interface.

Atmospheric Pressure Chemical Vapor Deposition Growth Window for Undoped Gallium Antimonide

1999 ◽  
Vol 14 (4) ◽  
pp. 1238-1245 ◽  
Author(s):  
A. Subekti ◽  
E. M. Goldys ◽  
Melissa J. Paterson ◽  
K. Drozdowicz-Tomsia ◽  
T. L. Tansley
Keyword(s):  
Chemical Vapor Deposition ◽  
Substrate Temperature ◽  
Vapor Deposition ◽  
Gas Flow ◽  
Gallium Antimonide ◽  
Film Growth ◽  
Growth Parameters ◽  
Hole Concentration ◽  
Chemical Vapor ◽  
Chemical Vapor Deposition Growth

Metalorganic chemical vapor deposition (MOCVD) GaSb growth using trimethylgallium and trimethylantimony as a function of substrate temperature and V/III ratio was examined. These parameters were found to have a significant effect on the growth rate and surface morphology of the GaSb films. A phase diagram is used to interpret the effect of these growth parameters on the GaSb film growth. The region of single-phase growth was found to be narrow, falling between 540 and 560 °C. The optimum growth conditions for the MOCVD growth of GaSb have been determined for a TMGa flow rate of 20 sccm and a carrier gas flow of 8 l/min. The optimum substrate temperature and V/III ratio were found to be 540 °C and 0.72, respectively. In these conditions the lowest hole concentration of 5 × 1016 cm-3 and the highest room temperature mobility of 500 cm2 V-1 s-1 were achieved, accompanied by a steep, well-resolved band edge at 0.72 eV.

Low Temperature Growth of Gaas Quantum Well Lasers by Modulated Beam Epitaxy

1991 ◽  
Vol 228 ◽  
Author(s):  
S. Xin ◽  
K. F. Longenbach ◽  
C. Schwartz ◽  
Y. Jiang ◽  
W. I. Wang
Keyword(s):  
Low Temperature ◽  
Quantum Well ◽  
Substrate Temperature ◽  
Quantum Wells ◽  
High Growth ◽  
Quantum Well Lasers ◽  
Single Quantum ◽  
Single Quantum Well ◽  
Temperature Growth ◽  
Low Temperature Growth

ABSTRACTGaAs single quantum well lasers have been successfully grown at low temperatures by a modulated beam epitaxy process in which the Al/Ga flux is held constant while the As flux is periodically shut off to produce a metal-rich surface. Devices grown at a substrate temperature of 500 °C exhibit threshold current densities below 1 kA/cm2. This value is lower than normally grown low temperature lasers and is the lowest achieved by any low substrate temperature growth technique. In addition, low temperature (10 K) photoluminescence of single quantum wells grown with this technique exhibit full-width half maximum values, comparable to that attainable by higher temperature growth techniques. The improved quality of these low temperature grown quantum structures is attributed to both a smoothing of the growth front and a reduction of excess As during the modulated beam epitaxy process. The high growth rates and less frequent shutter operation of this technique make it a more practical than migration enhanced epitaxy or atomic layer epitaxy for low temperature growth.

High Quality YBaCuO Thin Film Growth by Low-Temperature Metalorganic Chemical Vapor Deposition Using Nitrous Oxide

1993 ◽  
Vol 335 ◽  
Author(s):  
Hideaki Zama ◽  
Jun Saga ◽  
Takeo Hattor ◽  
Shunri Oda
Keyword(s):  
Chemical Vapor Deposition ◽  
Low Temperature ◽  
Vapor Deposition ◽  
Metalorganic Chemical Vapor Deposition ◽  
Film Growth ◽  
Chemical Vapor ◽  
Unit Cell ◽  
Temperature Growth ◽  
First Time ◽  
Metalorganic Chemical

AbstractLow-temperature growth of YBa2Cu3Ox films by metalorganic chemical vapor deposition using N2O as an oxidizing agent has been investigated. We have deposited superconducting YBa2Cu3Ox on (100)MgO substrates at 500°C for the first time. Films of 15nm-thick show zero-resistivity critical temperature of 80K. Films of as thin as three unit-cell-thick reveal the superconducting onset characteristics. This result suggests that superconductivity is arisen even from effectively monomolecular layer of YBa2Cu3Ox when we take into account monomolecular buffer layer and monomolecular cap layer. YBa2Cu3Ox films of 9nm-thick grown on (100)SrTiO3 at 600°C with Tc(zero) of 79K and with peak to valley roughness fluctuation of two unit-cell have been obtained.

Low Temperature growth of poly-crystalline film of Silicon-rich Silicon-Germanium by Reactive Thermal Chemical Vapor Deposition

2000 ◽  
Vol 638 ◽  
Author(s):  
Kousaku Shimizu ◽  
Jianjun Zhang ◽  
Jeong-Woo Lee ◽  
Jun-Ichi Hanna
Keyword(s):  
Chemical Vapor Deposition ◽  
Low Temperature ◽  
Residence Time ◽  
Vapor Deposition ◽  
Gas Flow ◽  
Chemical Vapor ◽  
Temperature Growth ◽  
Low Temperature Growth ◽  
Thermal Chemical Vapor Deposition ◽  
Source Materials

AbstractLow temperature growth of poly-SiGe has been investigated by reactive thermal chemical vapor deposition method, which is a newly developed technique for preparing poly-SiGe by using redox reactions in a set of source materials, i.e., Si2H6 and GeF4. In order to prepare silicon-rich poly-SiGe of high mobility, a series of experiment on total pressure, gas flow rates of the source materials and dilution gas of He, and residence time at 450°C has been investigated.At 0.45 Torr, high crystallinity films with high silicon content were prepared, however, homogeneity of film thickness and reproducibility of the film growth was quite low for device application. For overcoming this problem, the growth condition has been studied especially in higher-pressure range of 5-15 Torr. Appropriate choice of the residence time and the gas flow ratios lead to significant improvement in the Si content in the films. Finally, more than 95% of silicon-rich poly-SiGe films, which is p-type, has 7.5 cm2/Vs of Hall mobility and (220) orientation, have been prepared at 10 Torr and 450°C within ±2% fluctuation of reproducibility which is enough to fabricate devices.

Excimer Laser Induced Photolytic Deposition of Aluminum Nitride: Ftlm Growth and Properties

1995 ◽  
Vol 397 ◽  
Author(s):  
G. Radhakrishnan ◽  
P.M. Adams ◽  
N. Marquez
Keyword(s):  
Electron Microscopy ◽  
Aluminum Nitride ◽  
Substrate Temperature ◽  
Gas Phase ◽  
Excimer Laser ◽  
Film Growth ◽  
Aln Film ◽  
Fused Quartz ◽  
Photolysis Laser ◽  
193 Nm

ABSTRACTExcimer laser photolysis has been used for the growth of smooth and well-adhering thin films of aluminum nitride (AlN) on Si, fused quartz, and KBr substrates at temperatures as low as 350 K. The photolysis was carried out at 193 nm, with the laser beam propagating parallel to the substrate. Trimethylamine alane and ammonia were used as gas-phase precursors. The growth rate of these films was investigated as a function of laser fluence. These measurements, as well as other investigations of film growth with and without the photolysis laser, reveal that no AlN film is produced in the absence of laser-induced photolysis of the precursors. The morphology and physical properties of these laser-grown films have been studied by scanning electron microscopy, X-ray diffraction, and transmission electron microscopy. Optical absorption spectra of films grown on fused quartz were measured as a function of substrate temperature. A substrate temperature of 350 K was found to be optimum for obtaining good film quality while precluding any effects due to the thermal decomposition of the precursors. The films have excellent dielectric properties as shown by I-V and C-V measurements. The details of AlN film growth using low-temperature gas-phase photolysis at 193 nm and the characterization of these laser grown films will be discussed.

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