Effects of film thickness and alkaline concentration on dissolution kinetics of poly(4-hydroxystyrene) in alkaline aqueous solution

2022 ◽  
Author(s):  
Naoki Tanaka ◽  
Kyoko Matsuoka ◽  
Takahiro KOZAWA ◽  
Takuya Ikeda ◽  
Yoshitaka Komuro ◽  
...  
Keyword(s):  
Aqueous Solution ◽  
Film Thickness ◽  
Thick Films ◽  
Dissolution Kinetics ◽  
Dissolution Behavior ◽  
Chemically Amplified ◽  
Fundamental Understanding ◽  
Chemically Amplified Resists ◽  
Kinetics Of ◽  
Simple Combination

Abstract The dissolution behavior of a simple combination of poly(4-hydroxystyrene) (PHS) films and tetramethylammonium hydroxide (TMAH) aqueous solution was analyzed to gain a fundamental understanding of the effects of film thickness and alkaline concentration on the dissolution kinetics of chemically amplified resists (CARs). Films of four different thicknesses, from thick (approximately 900 nm) to thin (approximately 50 nm), were developed in 22 different developers of different concentrations. The dissolution behavior of each combination was observed using a quartz crystal microbalance (QCM). Differences in dissolution kinetics due to film thickness were observed even between relatively thick films such as 900- and 500-nm thick films in dilute developers. These differences were considered to be caused by the diffusion of the solution into the films. Thin films also showed characteristic behavior with dilution. This behavior was due to the interaction between the substrate and the films, unlike in the case of thick films.

Dissolution kinetics of chemically amplified resists

1993 ◽  
Author(s):  
Toshiro Itani ◽  
Katsuyuki Itoh ◽  
Kunihiko Kasama
Keyword(s):  
Dissolution Kinetics ◽  
Chemically Amplified ◽  
Chemically Amplified Resists ◽  
Kinetics Of

High resolution patterning in chemically amplified resists: the effect of film thickness

2001 ◽  
Author(s):  
David R. Medeiros ◽  
Wayne M. Moreau ◽  
Karen E. Petrillo ◽  
Maharshi Chauhan ◽  
Wu-Song Huang ◽  
...  
Keyword(s):  
High Resolution ◽  
Film Thickness ◽  
Chemically Amplified ◽  
Chemically Amplified Resists

Relationship between surface free energy and development process (swelling and dissolution kinetics) of poly(4-hydroxystyrene) film in water and 2.38 wt% tetramethylammonium hydroxide aqueous solution

2021 ◽  
Author(s):  
Yuko Tsutsui Ito ◽  
Takahiro KOZAWA
Keyword(s):  
Aqueous Solution ◽  
Free Energy ◽  
Surface Free Energy ◽  
Water Intake ◽  
Dissolution Kinetics ◽  
Exposure Dose ◽  
Tetramethylammonium Hydroxide ◽  
Polar Components ◽  
Dispersion Component ◽  
Chemically Amplified Resists

Abstract With the sharpening of optical images, the capability of resist materials has become a serious concern in lithography. The dissolution of a resist polymer is key to the realization of ultrafine patterning. However, the details of the dissolution of resist polymers remain unclarified. In this study, the relationships of surface free energy with swelling and dissolution kinetics were investigated using poly(4-hydroxystyrene) (PHS) film with triphenylsulfonium-nonaflate (TPS-nf). Developers were water and 2.38 wt% tetramethylammonium hydroxide (TMAH) aqueous solution. PHS and TPS-nf are a typical backbone polymer (a dissolution agent) and a typical acid generator of chemically amplified resists, respectively. The water intake and dissolution of PHS film with TPS-nf became fast with increasing UV exposure dose. It was found that the increase in the polar components (particularly, the hydrogen bonding component) and the decrease in the dispersion component of surface free energy underlie the fast water intake and dissolution.

Kinetics of chemically amplified resists

1995 ◽  
Author(s):  
Gregory M. Wallraff ◽  
William D. Hinsberg ◽  
Frances A. Houle ◽  
Juliann Opitz ◽  
Dale Hopper ◽  
...  
Keyword(s):  
Chemically Amplified ◽  
Chemically Amplified Resists ◽  
Kinetics Of

scholarly journals Dissolution Kinetics of International Simple Glass and Formation of Secondary Phases at Very High Surface Area to Solution Ratio in Young Cement Water

Materials ◽  
2021 ◽  
Vol 14 (5) ◽  
pp. 1254
Author(s):  
Karine Ferrand ◽  
Martina Klinkenberg ◽  
Sébastien Caes ◽  
Jenna Poonoosamy ◽  
Wouter Van Renterghem ◽  
...  
Keyword(s):  
High Surface ◽  
High Surface Area ◽  
Dissolution Kinetics ◽  
Dissolution Behavior ◽  
Secondary Phases ◽  
Residual Rate ◽  
Glass Dissolution ◽  
Ph Decrease ◽  
Kinetics Of ◽  
Very High

Static dissolution experiments were carried out with the reference International Simple Glass under hyperalkaline pH at 70 °C and very high SA/V ratio. Three aspects of glass dissolution behavior were investigated, (1) the rate drop regime and the residual rate (stage II), (2) the formation of secondary phases including thermodynamic aspects, and (3) the microstructure of the interface of altered glass and secondary phases. A very low residual rate of 6 × 10−6 g/m2d was determined based on boron release, which was several orders of magnitude lower than the initial rate established between the start of the experiments and the first sampling on day 59. The presence of a porous layer with a thickness varying between 80 nm and 250 nm and a pore size between 10 nm and 50 nm was observed. CSH phases with a low Ca/Si ratio of 0.3–0.4 and zeolites were also visible at the surface of the altered glass grains, but no glass alteration resumption occurred, probably due to an important pH decrease already at day 59. Thermodynamic calculations assuming congruent glass dissolution and precipitation of the dissolved aqueous species confirmed the precipitation of CSH phases and zeolites.

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