Effects of Substrate Bias Voltage on the Microstructure of Cr-Al-N Coatings

2008 ◽  
Vol 373-374 ◽  
pp. 167-171 ◽  
Author(s):  
Ming Zhu ◽  
Shu Wang Duo ◽  
Tian Peng Li ◽  
Mei Shuan Li ◽  
Yan Chun Zhou
Keyword(s):  
Grain Size ◽  
Bias Voltage ◽  
Failure Load ◽  
Lattice Parameter ◽  
Preferred Orientation ◽  
Negative Bias ◽  
Substrate Bias ◽  
Reactive Magnetron ◽  
Negative Bias Voltage ◽  
Substrate Bias Voltage

Cr-Al-N coatings with the thickness of about 2 μm have been prepared by a reactive magnetron sputtering method. The effects of substrate negative bias voltage (VB) on the microstructure and critical failure load have been investigated as the VB varied from 0 to –150 V. With VB increasing, grain size, lattice parameter and microstrain increase. (111) preferred orientation dominates in the coatings deposited under 0 and –50 V, while a (200) preferred orientation developed when VB further raised. The reasons for these variation caused by VB are discussed.

Effects of Substrate Bias Voltage on the Critical Failure Load of Cr-Al-N Coatings

2011 ◽  
Vol 291-294 ◽  
pp. 180-183
Author(s):  
Shu Wang Duo ◽  
Ming Zhu ◽  
Jin Min Ge ◽  
Xiang Ming He ◽  
Liang Meng
Keyword(s):  
Bias Voltage ◽  
Failure Load ◽  
Scratch Test ◽  
Substrate Bias ◽  
Negative Bias Voltage ◽  
Substrate Bias Voltage ◽  
Aluminum Target ◽  
Maximum Value ◽  
Failure Loads ◽  
Sputtering System

Cr-Al-N coatings with the thickness of about 2 mm have been prepared in a magnetron sputtering system by reactive co-sputtering from a chromium target and an aluminum target in a mixed Ar/N2atmosphere. The effects of substrate negative bias voltage (VB) on the microstructure and critical failure load have been investigated by a scratch test as the VB varied from 0 to –150 V. The critical failure load reached the maximum value for the coating deposited under VB = –50 V, then decreased with VB further increasing. Re-sputter effect of The heavy bombardment of the ion to the substrate improve the critical failure load for the coating deposited under VB = –50 V. The decrease of the critical failure loads for the coatings deposited under –100V and –150 V probably resulted from the high microstrain in the crystal lattice.

Structure, morphology and mechanical properties of AlCrN coatings obtained by the method of cathodic arc evaporation

2018 ◽  
Vol 23 (2) ◽  
pp. 61-69
Author(s):  
Adam Gilewicz ◽  
Roman Jędrzejewski ◽  
Piotr Myśliński ◽  
Bogdan Warcholiński
Keyword(s):  
Deposition Rate ◽  
Bias Voltage ◽  
Roughness Parameter ◽  
Nitrogen Pressure ◽  
Negative Bias ◽  
Negative Bias Voltage ◽  
Substrate Bias Voltage ◽  
Cathodic Arc Evaporation ◽  
Arc Evaporation ◽  
Cathodic Arc

CrAlN coatings have been formed on steel substrates (HS6-5-2) using cathodic arc evaporation. The influence of nitrogen pres-sure and substrate bias voltage on the properties of CrAlN coatings formed from Al80Cr20 cathode, such as: chemical and phase composition of the coatings, their surface morphology, deposition rate, hardness and adhesion to the substrate have been investigated. It has been determined that the rate of the deposition of coatings in the nitrogen atmosphere with the pressure of 3 Pa is the highest and that with the increase of the negative bias voltage of the substrate the deposition rate decreases. The roughness parameter Ra of the coating surface decreases as the nitrogen pressure increases during their formation. Presumably, this is related to the reduction of the amount of macroparticles on the surface of the coating. The hardness of the coatings (taking into account the measurement uncertainty) is independent of the nitrogen pressure, but it increases with the increase of the negative bias voltage of the substrate. The adhesion of the coating increases with the increase of the nitrogen pressure to 3–4 Pa, and then it decreases. The increase in the negative bias voltage of the substrate during the formation of the coating deteriorates its adhesion to the substrate.

Effect of Negative Bias Voltage on Corrosion Resistance of TiN Coating Deposited by MAIP

2011 ◽  
Vol 399-401 ◽  
pp. 1898-1902 ◽  
Author(s):  
Lin Yuan ◽  
Yuan Gao ◽  
Wei Zhang ◽  
Cheng Lei Wang ◽  
Zhi Kang Ma ◽  
...  
Keyword(s):  
Stainless Steel ◽  
Corrosion Resistance ◽  
Bias Voltage ◽  
Electrochemical Measurement ◽  
Negative Bias ◽  
Substrate Bias ◽  
Tin Coating ◽  
Negative Bias Voltage ◽  
Tin Coatings ◽  
Tin Film

In this study, TiN coatings were deposited on 201 stainless steel by multi-arc ion plating (MAIP). The effect of negative bias voltage on the surface microstructure, hardness, phase structure and the corrosion resistance of the coatings were investigated by SEM, hardness instrument, XRD and electrochemical measurement. The number and size of droplets decreased when the negative bias voltage increased from -100 V to -300 V. But when the substrate bias increased to a certain value, there were some pits appeared. The hardness increased at first and decreased later with the increasing of the negative bias voltage. When the negative bias voltage was -200 V, the hardness was the highest. The intrinsic hardness of TiN film was 2195HV. In 3.5% NaCl solution, the corrosion resistance of TiN coatings samples were improved slightly compared with 201 stainless steel. In l mol/L H2SO4 solution, the corrosion resistance of -100V sample was the best, the corrosion resistance of -100V coating sample was increased 486 times compared with untreated 201 stainless steel.

DEPOSITION OF CHROMIUM-CARBON FILMS BY MAGNETRON SPUTTERING OF CHROMIUM AND CARBON TARGETS

2005 ◽  
Vol 19 (21) ◽  
pp. 1039-1050 ◽  
Author(s):  
Q. R. HOU ◽  
H. Y. ZHANG ◽  
Y. B. CHEN
Keyword(s):  
Elastic Modulus ◽  
Magnetron Sputtering ◽  
Bias Voltage ◽  
Carbon Films ◽  
Silicon Substrates ◽  
Substrate Bias ◽  
Negative Bias Voltage ◽  
Substrate Bias Voltage ◽  
Mechanical And Electrical Properties ◽  
Pure Argon Atmosphere

Chromium-carbon films have been deposited on silicon substrates by magnetron sputtering of chromium and carbon targets in pure argon atmosphere. The composition of the films was examined by Auger electron spectroscopy. Oxygen, nitrogen, and iron were the major impurities incorporated in the films. The mechanical and electrical properties of the films were investigated as a function of negative bias voltage applied to substrates. The hardness and elastic modulus were measured by a nano-indenter and the values are around 17.0±0.9 GPa and 245±11 GPa , respectively. The hardness and elastic modulus of the films increased while the electrical resistivity decreased when the substrate bias voltage was applied. The lowest resistivity (~ 267 μ ohm-cm ) was obtained at the substrate bias voltage of 50 V. The temperature dependence of resistivity of the films was measured in air from room temperature to 673 K. The time dependence of resistivity of the films was also measured in air at 673 K. It was found that the resistivity changed little with temperature or time.

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