Effect of Sputtering Power on Photocatalytic Activity of Thin TiO2 Films

2015 ◽  
Vol 814 ◽  
pp. 173-177
Author(s):  
Zhi Hong Luo ◽  
Jin Feng Leng ◽  
Wen Shuang He ◽  
De Jiang Hu
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Uv Light ◽  
Rutile Phase ◽  
Dislocation Network ◽  
Radio Frequency Magnetron Sputtering ◽  
Rutile Structure ◽  
Methyl Orange Degradation ◽  
Uv Light Irradiation ◽  
Sputtering Power

TiO2 thin films with outstanding photocatalysis can potentially be used for photocatalysis device in the field of environmental protection. TiO2 thin film (99.99%) was fabricated successfully by power metallurgy. The effect of sputtering power on TiO2 thin films by radio frequency magnetron sputtering was investigated. The results show that the higher sputtering power is beneficial for the growth of Rutile structure with superior photocatalysis. With the increasing of sputtering power, the rate of methyl orange degradation increases under UV light irradiation. The degradation rate of TiO2 thin film under sputtering power 75W and 165W is 40% and 80% respectively. This is attributed to the increase of the rutile phase with many defects and dislocation network under higher sputtering power.

Electrical Property of TiO2 Thin Film Deposited by RF Sputtering

2007 ◽  
Vol 127 ◽  
pp. 221-226
Author(s):  
Kiyozumi Niizuma ◽  
Takahiro Hayakawa ◽  
Yoshio Utsushikawa
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Electrical Property ◽  
Tio2 Thin Film ◽  
Uv Light ◽  
Anatase Phase ◽  
Rf Sputtering ◽  
Light Irradiation ◽  
Tio2 Thin Films ◽  
Uv Light Irradiation

The authors investigated on the electrical property and the photo-catalytic activity of TiO2 thin films deposited in Ar+O2 atmosphere by RF magnetron sputtering. From the result of x-ray diffraction, the anatase phase was formed in TiO2 thin films. In TiO2 thin film deposited under a gas pressure of 3.0Pa, the contact angle of water showed 9 ﾟ, and the decomposition rate of Methylene Blue (measuring the absorbance of the reference light) showed -0.067 with UV light irradiation. Moreover, it revealed that the electric resistivity of TiO2 thin film deposited under the same conditions decreased from 8.0×103Ω･m to 1.4×10-2Ω･m with UV light irradiation.

scholarly journals A Study on the Characteristic and Antibacterial Activity of Ti3Ox Thin Films

Catalysts ◽  
2021 ◽  
Vol 11 (11) ◽  
pp. 1416
Author(s):  
Endrika Widyastuti ◽  
Fu-Yang Xu ◽  
Chen-Tien Chiu ◽  
Jhen-Hau Jan ◽  
Jue-Liang Hsu ◽  
...  
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Antibacterial Activity ◽  
Dye Degradation ◽  
Uv Light ◽  
Antibacterial Properties ◽  
Blue Dye ◽  
Tio2 Thin Films ◽  
E Coli ◽  
Sputtering Power

A pure Ti target in Ar/O2 gas mixture was used to synthesize Ti3Ox thin film on a glass substrate by Reactive High-Power Impulse Magnetron Sputtering (HiPIMS) under different sputtering power (2 and 2.5 kW). The influence of HiPIMS parameters on thin films’ structural, morphological, chemical composition, optical and photocatalytic, and antibacterial properties was investigated. In this study, Ti3Ox thin films can be synthesized using the HiPIMS method without the post-annealing process. Two co-existence phases (hexagonal Ti3O and base-centered monoclinic Ti3O5 phases) existed on the Ti3Ox films. It is found that the peak intensity of (006) Ti3O hexagonal slightly increased as the sputtering power increased from 2 to 2.5 kW. The Ti3Ox thin-film bandgap values were 3.36 and 3.50 eV for 2 and 2.5 kW, respectively. The Ti3Ox films deposited at 2.5 kW showed good photocatalytic activity under UV light irradiation, with a higher methylene blue dye degradation rate than TiO2 thin films. The antibacterial study on Ti3Ox thin films exhibited a high inhibition percentage against E. coli and S. aureus. This study demonstrates that Ti3Ox thin films can promote high photocatalytic and antibacterial activity.

Preparation and Characterization of TiO2 Photocatalytic Thin Film Prepared by Sol-Gel Dip Coating

2012 ◽  
Vol 476-478 ◽  
pp. 2398-2402
Author(s):  
Jiao Jiao Wang ◽  
Kai Zheng ◽  
Christian Rüssel ◽  
Wen Liang
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Rhodamine B ◽  
Uv Light ◽  
Anatase Phase ◽  
Sol Gel ◽  
Rutile Phase ◽  
Dip Coating ◽  
High Photocatalytic Activity ◽  
Tio2 Thin Films

Titanium dioxide thin films have been prepared from tetrabutyl-orthotitanate solution and methanol as a solvent by sol-gel dip coating technique. The thermal properties of TiO2 gel were analyzed by thermogravimetry and differential thermal analysis (TG-DTA). Structural properties of TiO2 thin films at different heat treatment temperatures were analyzed by X-ray diffraction (XRD), Infrared Raman spectroscopy and scanning electron microscopy (SEM). The results show that the TiO2 thin films crystallize in anatase phase at 400 °C and the crystallinity of anatase phase was improved with increasing temperature. The TiO2 thin films crystallize into the anatase-rutile phase at 600 °C and further into the rutile phase at 800 °C. The photocatalytic performance of TiO2 film was tested for the degradation of 2×10-5 mol/L Rhodamine B. The degradation of Rhodamine B solutions reached 0.9×10-5 mol/L after irradiated for 8 h under UV light. The TiO2 thin film exhibited relatively high photocatalytic activity towards degrading Rhodamine B.

Epitaxial Growth of Organic Nonlinear Optical Materials

1992 ◽  
Vol 247 ◽  
Author(s):  
Y. Hattori ◽  
A. Mizoguchi ◽  
Y. Ogaki ◽  
A. Nishimtjra
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Epitaxial Growth ◽  
Molecular Orientation ◽  
Optical Materials ◽  
Molecular Beam ◽  
Uv Light ◽  
Control Technique ◽  
Vacuum Deposition ◽  
Uv Light Irradiation

ABSTRACTAs an orientation control technique for organic materials, epitaxial growth on crystal substrates was studied for DBNA, a derivative of p-nitroani1 ine, and polydiacetylene(PDA)-3BCMU using Vacuum Deposition and Molecular Beam Epitaxy(MBE).The thin film of DBNA was epitaxially grown on a KCl(001) surface by Vacuum Deposition. Molecular orientation to the substrate (parallel or normal) was controlled by MBE. PDA-3BCMTJ thin films were prepared by UV light irradiation of DA-3BCMU(monomer) thin films which were epitaxially grown on a KCl(001) surface, x(3) values of this oriented thin film were larger than those of unoriented spin-casted thin film.

Photocatalytic performance of Cu-doped titania thin films under UV light irradiation

2021 ◽  
Vol 553 ◽  
pp. 149535
Author(s):  
Elisa Moretti ◽  
Elti Cattaruzza ◽  
Cristina Flora ◽  
Aldo Talon ◽  
Eugenio Casini ◽  
...  
Keyword(s):  
Thin Films ◽  
Photocatalytic Performance ◽  
Uv Light ◽  
Light Irradiation ◽  
Uv Light Irradiation ◽  
Doped Titania

Structural, Morphological and Adhesion Properties of Cofeb Thin Films Deposited by DC Magnetron Sputtering

2013 ◽  
Vol 802 ◽  
pp. 47-52
Author(s):  
Chuleerat Ibuki ◽  
Rachasak Sakdanuphab
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Grain Size ◽  
Magnetron Sputtering ◽  
Crystalline Structure ◽  
Glass Substrate ◽  
Intrinsic Stress ◽  
Dc Magnetron Sputtering ◽  
Adhesion Properties ◽  
Sputtering Power

In this work the effects of amorphous (glass) and crystalline (Si) substrates on the structural, morphological and adhesion properties of CoFeB thin film deposited by DC Magnetron sputtering were investigated. It was found that the structure of a substrate affects to crystal formation, surface morphology and adhesion of CoFeB thin films. The X-Ray diffraction patterns reveal that as-deposited CoFeB thin film at low sputtering power was amorphous and would become crystal when the power increased. The increase in crystalline structure of CoFeB thin film is attributed to the crystalline substrate and the increase of kinetic energy of sputtering atoms. Atomic Force Microscopy images of CoFeB thin film clearly show that the roughness, grain size, and uniformity correlate to the sputtering power and the structure of substrate. The CoFeB thin film on glass substrate shows a smooth surface and a small grain size whereas the CoFeB thin film on Si substrate shows a rough surface and a slightly increases of grain size. Sticky Tape Test on CoFeB thin film deposited on glass substrate indicates the adhesion failure with a high sputtering power. The results suggest that the crystalline structure of substrate affects to the atomic bonding and the sputtering power affects to intrinsic stress of CoFeB thin film.

ELECTRICAL AND OPTICAL PROPERTIES OF ZnO THIN FILMS PREPARED BY R.F. MAGNETRON SPUTTERING

2011 ◽  
Vol 25 (20) ◽  
pp. 2741-2749 ◽  
Author(s):  
J. C. ZHOU ◽  
L. LI ◽  
L. Y. RONG ◽  
B. X. ZHAO ◽  
Y. M. CHEN ◽  
...  
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Optical Properties ◽  
Magnetron Sputtering ◽  
Oxide Thin Film ◽  
Zno Thin Films ◽  
Zno Thin Film ◽  
Electrical And Optical Properties ◽  
Axis Orientation ◽  
Sputtering Power

High transparency and conductivity of transparent conducting oxide thin film are very important for improving the efficiency of solar cells. ZnO thin film is a better candidate for transparent conductive layer of solar cell. N-type ZnO thin films were prepared by radio-frequency magnetron sputtering on glass substrates. ZnO thin films underwent annealing treatment after deposition. The influence of the sputtering power on the surface morphology, the electrical and optical properties were studied by AFM, XRD, UV2450 and HMS-3000. The experimental results indicate that the crystal quality of ZnO thin film is improved and all films show higher c-axis orientation with increasing sputtering power from 50 to 125 W. The average transparency of ZnO thin films is higher than 90% in the range of 400–900 nm between the sputtering power of 50–100 W. After the rapid thermal annealing at 550°C for 300 s under N2 ambient, the minimum resistivity reach to 10-2Ω⋅ cm .

scholarly journals Chitosan Membrane Embedded With ZnO/CuO Nanocomposites for the Photodegradation of Fast Green Dye Under Artificial and Solar Irradiation

2018 ◽  
Vol 13 ◽  
pp. 117739011876336 ◽  
Author(s):  
Eman Alzahrani
Keyword(s):  
Thin Film ◽  
Uv Light ◽  
Analytical Techniques ◽  
Light Irradiation ◽  
Solar Irradiation ◽  
Solar Light ◽  
Fast Green ◽  
X Ray ◽  
Uv Light Irradiation ◽  
Animal Populations

Fast Green (FCF) dye is commonly used in both cytology and histology applications. Previous studies have found that it can cause mutagenic and tumorigenic effects in experimental human and animal populations. It can also be a source of skin, eye, respiratory, and digestive irritation. The purpose of this study was to examine the use of thin film membranes to degrade FCF. A thin film membrane of chitosan (CS) was fabricated and subsequently filled with zinc oxide nanoparticles (ZnO) or ZnO/CuO-heterostructured nanocomposites. The CS membrane was used as a matrix, and the nanomaterials were used as photocatalysts. The prepared membranes were characterised by four analytical techniques: atomic force microscopy, scanning electron microscopy, X-ray diffraction, and energy-dispersive X-ray analyses. The photocatalytic activity of the fabricated membranes was evaluated by performing experiments in which aqueous solutions of FCF dye that contained the fabricated membrane were irradiated with solar light or UV light. The photodegradation percentage was spectrophotometrically determined by monitoring the maximum wavelengths (λmax) of FCF at 623 nm for different irradiation times. The decolourisation percentages of the dye under solar light were 57.90% and 60.23% using the CS-ZnO and CS-ZnO/CuO membranes, respectively. When UV light irradiation was employed as the source of irradiation, the photodegradation percentages of FCF were 71.45% and 91.21% using the CS-ZnO and CS-ZnO/CuO membranes, respectively. These results indicated that the best photocatalytic system for the degradation of FCF dye was CS-ZnO/CuO membrane in combination with UV light irradiation. The study also found that it was easy to separate the prepared membranes after the reaction without the need for a centrifuge or magnet. The results demonstrate the potential for CS-ZnO and CS-ZnO/CuO membranes for use as effective sorbents during the process of photodegradation of harmful dyes within waste water recycling practices.

Synthesis of Fluorinated SnO2 Hollow Nanospheres and Their Improved Photocatalytic Performance

NANO ◽  
2015 ◽  
Vol 10 (08) ◽  
pp. 1550109
Author(s):  
Guoe Cheng ◽  
You-Zhi Wang ◽  
Yu Zhang ◽  
Chun-Ling Zhu
Keyword(s):  
Photocatalytic Performance ◽  
Uv Light ◽  
Reaction System ◽  
Rutile Phase ◽  
Hollow Nanospheres ◽  
Hollow Nanosphere ◽  
Surface Areas ◽  
Uv Light Irradiation ◽  
Polyethylene Glycol 200 ◽  
Fluorine Ions

Fluorinated SnO2 hollow nanospheres (HS) were synthesized via a solvothermal treatment of stannous fluoride in the presence of hydrogen peroxide. These nanospheres with diameters from 60[Formula: see text]nm to 100[Formula: see text]nm were composed of small nanoparticles with rutile phase. A small amount of fluorine ions were observed to be adsorbed on the surface of SnO2 physically. The introduction of polyethylene glycol 200 (PEG 200) in the reaction system could obviously improve the crystallinity and specific surface areas of the product while maintaining the hollow nanosphere structure. Furthermore, the as-prepared SnO2 sample (HS-PEG) showed a much enhanced photocatalytic activity with 100% degradation of Rhodamine B (RhB) within only 40[Formula: see text]min under UV light irradiation.

UV-light irradiation effects on oxide superconducting thin films

1991 ◽  
Vol 27 (2) ◽  
pp. 1544-1547 ◽  
Author(s):  
A. Enokihara ◽  
S. Kohiki ◽  
H. Higashino ◽  
K. Setsune ◽  
K. Wasa
Keyword(s):  
Thin Films ◽  
Uv Light ◽  
Light Irradiation ◽  
Superconducting Thin Films ◽  
Irradiation Effects ◽  
Uv Light Irradiation
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