scholarly journals Formation of Si Nano Hole Arrays Using a Self-assembled Nanolithography Mask and Cu Fill of the Array

2013 ◽  
Vol 64 (12) ◽  
pp. 659-661
Author(s):  
Eiichi KONDOH ◽  
Kakeru TAMAI ◽  
Michio MATSUMURA
Keyword(s):  
2003 ◽  
Vol 387 (1-2) ◽  
pp. 49-56 ◽  
Author(s):  
G.W. Crabtree ◽  
U. Welp ◽  
Z.L. Xiao ◽  
J.S. Jiang ◽  
V.K. Vlasko-Vlasov ◽  
...  
Keyword(s):  

Author(s):  
Jacob S. Wilson ◽  
Wipula P. R. Liyanage ◽  
Michelle L. Gegel ◽  
Manashi Nath ◽  
Edward C. Kinzel

We report on using Nanosphere Photolithography (NPL) for submicron patterning of Frequency Selective Surfaces (FSS). NPL is a combination of two techniques; colloidal nanolithography — where nanospheres form a self-assembled hexagonal close-packed (HCP) array when dispensed on a surface, and photonic jets — which are created when light is incident onto a microsphere in contact with a surface. NPL creates a mask-free HCP hole array in the photoresist. This pattern can be used with evaporation and lift-off to create an array of antenna elements, constituting the FSS. Alternatively, electrodeposition techniques can be used to deposit the metal elements. The later is particularly appealing as it lends itself to reel-to-reel fabrication techniques. Finally, we demonstrate that geometries other than simple hole arrays can be patterned in the photoresist by exposing the microsphere array with off normal incidence light.


1998 ◽  
Vol 95 (6) ◽  
pp. 1339-1342 ◽  
Author(s):  
R. Michalitsch ◽  
A. El Kassmi ◽  
P. Lang ◽  
A. Yassar ◽  
F. Garnier

2003 ◽  
Vol 104 ◽  
pp. 459-462 ◽  
Author(s):  
R. Klauser ◽  
M. Zharnikov ◽  
I.-H. Hong ◽  
S.-C. Wang ◽  
A. Gölzhäuser ◽  
...  

2001 ◽  
Vol 171 (12) ◽  
pp. 1365
Author(s):  
E.E. Vdovin ◽  
Yu.N. Khanin ◽  
Yu.V. Dubrovskii ◽  
A. Veretennikov ◽  
A. Levin ◽  
...  

Sign in / Sign up

Export Citation Format

Share Document