Gas‐phase free radical reactions in the glow‐discharge deposition of hydrogenated amorphous silicon from silane and disilane

1985 ◽  
Vol 57 (6) ◽  
pp. 2290-2291 ◽  
Author(s):  
Frank J. Kampas
Keyword(s):  
Free Radical ◽  
Glow Discharge ◽  
Amorphous Silicon ◽  
Gas Phase ◽  
Hydrogenated Amorphous Silicon ◽  
Radical Reactions ◽  
Free Radical Reactions ◽  
Hydrogenated Amorphous ◽  
Glow Discharge Deposition

Deuterium Incorporation into Glow-Discharge Deposited Deuterated-Hydrogenated Amorphous Silicon

1995 ◽  
Vol 377 ◽  
Author(s):  
L. S. Sidhu ◽  
F. Gaspari ◽  
S. K. O'Leary ◽  
S. Zukotynski
Keyword(s):  
Glow Discharge ◽  
Amorphous Silicon ◽  
Gas Phase ◽  
Hydrogenated Amorphous Silicon ◽  
Growth Surface ◽  
Direct Reaction ◽  
Deuterium Incorporation ◽  
Phase Mixing ◽  
Dominant Process ◽  
Hydrogenated Amorphous

ABSTRACTWe investigate deuterium incorporation into deuterated-hydrogenated amorphous silicon grown by the saddle-field glow-discharge of deuterium and silane. The presence of HD and SiH3D in the discharge suggests strong gas phase mixing. The dominant process of deuterium incorporation into the growing film appears to be the direct reaction between deuterium and the growth surface.

Hydrogenated amorphous silicon films by 60 Hz glow‐discharge deposition

1993 ◽  
Vol 74 (1) ◽  
pp. 668-671 ◽  
Author(s):  
J. F. Fragalli ◽  
L. Misoguti ◽  
A. N. Nakagaito ◽  
V. Grivickas ◽  
V. S. Bagnato ◽  
...  
Keyword(s):  
Glow Discharge ◽  
Amorphous Silicon ◽  
Hydrogenated Amorphous Silicon ◽  
Silicon Films ◽  
Hydrogenated Amorphous ◽  
Glow Discharge Deposition

Optical switching in hydrogenated amorphous silicon–sulfur alloy prepared by glow discharge

2004 ◽  
Vol 345-346 ◽  
pp. 302-305 ◽  
Author(s):  
S. Al-Dallal ◽  
F.Z. Henari ◽  
S.M. Al-Alawi ◽  
S.R. Arekat ◽  
H. Manaa
Keyword(s):  
Glow Discharge ◽  
Amorphous Silicon ◽  
Optical Switching ◽  
Hydrogenated Amorphous Silicon ◽  
Hydrogenated Amorphous
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