ILT optimization of EUV masks for sub-7nm lithography

33rd European Mask and Lithography Conference ◽

10.1117/12.2279912 ◽

2017 ◽

Author(s):

Kevin Hooker ◽

Kevin Lucas ◽

Bernd Küchler ◽

Aram Kazarian ◽

Guangming Xiao

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