33rd European Mask and Lithography Conference
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26
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2
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Published By SPIE

9781510613560, 9781510613577
Latest Documents Most Cited Documents Contributed Authors Related Sources Related Keywords

The role of model-based MPC in advanced mask manufacturing

2017 ◽  
Author(s):  
Ingo Bork ◽  
Peter Buck
Keyword(s):  
Model Based

Latest developments on EUV reticle and pellicle research and technology at TNO

2017 ◽  
Author(s):  
Rogier Verberk ◽  
Norbert Koster ◽  
Wilbert Staring ◽  
Edwin te Sligte

Improvements in the imaging performance of a high volume manufacturing EUV scanner with a special emphasis on the added value of the new illuminator for increased pupil flexibility

2017 ◽  
Author(s):  
Bartosz Bilski ◽  
Erik Wang ◽  
Friso Wittebrood ◽  
John MᶜNamara ◽  
Dorothe Oorschot ◽  
...  
Keyword(s):  
High Volume ◽  
Added Value ◽  
Imaging Performance

Half circle chrome loss by electrochemical effects

2017 ◽  
Author(s):  
Lydia Bahrig ◽  
Timo A. Wandel ◽  
Marcel Kristlib ◽  
Axel Feicke ◽  
Dirk Caspary ◽  
...  

ILT optimization of EUV masks for sub-7nm lithography

2017 ◽  
Author(s):  
Kevin Hooker ◽  
Kevin Lucas ◽  
Bernd Küchler ◽  
Aram Kazarian ◽  
Guangming Xiao

Characterizing electron beam induced damage in metrology and inspection of advance devices

2017 ◽  
Author(s):  
Violeta Navarro ◽  
Hamed Sadeghian ◽  
Abbas Mohtashami ◽  
Ilan Englard ◽  
Dror Shemesh ◽  
...  
Keyword(s):  
Electron Beam
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