33rd European Mask and Lithography Conference
Latest Publications

TOTAL DOCUMENTS

26

(FIVE YEARS 0)

H-INDEX

2

(FIVE YEARS 0)

Published By SPIE

9781510613560, 9781510613577

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Front Matter: Volume 10446

33rd European Mask and Lithography Conference ◽

10.1117/12.2302899 ◽

2017 ◽

Keyword(s):

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The role of model-based MPC in advanced mask manufacturing

33rd European Mask and Lithography Conference ◽

10.1117/12.2281894 ◽

2017 ◽

Author(s):

Ingo Bork ◽

Peter Buck

Keyword(s):

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Latest developments on EUV reticle and pellicle research and technology at TNO

33rd European Mask and Lithography Conference ◽

10.1117/12.2279672 ◽

2017 ◽

Author(s):

Rogier Verberk ◽

Norbert Koster ◽

Wilbert Staring ◽

Edwin te Sligte

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Technical trends of large-size photomasks for flat panel displays

33rd European Mask and Lithography Conference ◽

10.1117/12.2279601 ◽

2017 ◽

Author(s):

Koichiro Yoshida

Keyword(s):

Flat Panel Displays ◽

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Improvements in the imaging performance of a high volume manufacturing EUV scanner with a special emphasis on the added value of the new illuminator for increased pupil flexibility

33rd European Mask and Lithography Conference ◽

10.1117/12.2280379 ◽

2017 ◽

Author(s):

Bartosz Bilski ◽

Erik Wang ◽

Friso Wittebrood ◽

John MᶜNamara ◽

Dorothe Oorschot ◽

...

Keyword(s):

High Volume ◽

Added Value ◽

Imaging Performance

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Half circle chrome loss by electrochemical effects

33rd European Mask and Lithography Conference ◽

10.1117/12.2279699 ◽

2017 ◽

Author(s):

Lydia Bahrig ◽

Timo A. Wandel ◽

Marcel Kristlib ◽

Axel Feicke ◽

Dirk Caspary ◽

...

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New overlay measurement technique with an i-line stepper using embedded standard field image alignment marks for wafer bonding applications

33rd European Mask and Lithography Conference ◽

10.1117/12.2279621 ◽

2017 ◽

Author(s):

Philipp Kulse ◽

Kazuhiro Sasai ◽

Katrin Schulz ◽

Matthias Wietstruck

Keyword(s):

Measurement Technique ◽

Wafer Bonding ◽

Image Alignment ◽

Standard Field ◽

Alignment Marks

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Experimental verification of sub-wavelength holographic lithography physical concept for single exposure fabrication of complex structures on planar and nonplanar surfaces

33rd European Mask and Lithography Conference ◽

10.1117/12.2279736 ◽

2017 ◽

Author(s):

Vitaly Chernik ◽

Vadim Rakhovskiі ◽

Michael Borisov ◽

Dmitry Chelyubeev ◽

Peter Miheev ◽

...

Keyword(s):

Experimental Verification ◽

Holographic Lithography ◽

Complex Structures ◽

Single Exposure ◽

Physical Concept ◽

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Multi-trigger resist for electron beam lithography

33rd European Mask and Lithography Conference ◽

10.1117/12.2279767 ◽

2017 ◽

Author(s):

Dimitrios Kazazis ◽

Wolfgang Theis ◽

Alex P. Robinson ◽

Carmen Popescu ◽

Alex McClelland ◽

...

Keyword(s):

Electron Beam ◽

Electron Beam Lithography

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ILT optimization of EUV masks for sub-7nm lithography

33rd European Mask and Lithography Conference ◽

10.1117/12.2279912 ◽

2017 ◽

Author(s):

Kevin Hooker ◽

Kevin Lucas ◽

Bernd Küchler ◽

Aram Kazarian ◽

Guangming Xiao

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