Improvement of self-aligned dual patterning using spin-on-carbon mandrel

Advanced Etch Technology for Nanopatterning IX ◽

10.1117/12.2550987 ◽

2020 ◽

Author(s):

Caitlin Philippi ◽

Sophie Thibaut ◽

Andrew Metz ◽

Akiteru Ko ◽

Angélique Raley ◽

...

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