Advanced Etch Technology for Nanopatterning IX
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TOTAL DOCUMENTS

21
(FIVE YEARS 21)

H-INDEX

1
(FIVE YEARS 1)

Published By SPIE

9781510634251, 9781510634268
Latest Documents Most Cited Documents Contributed Authors Related Sources Related Keywords

Improvement of self-aligned dual patterning using spin-on-carbon mandrel

2020 ◽  
Author(s):  
Caitlin Philippi ◽  
Sophie Thibaut ◽  
Andrew Metz ◽  
Akiteru Ko ◽  
Angélique Raley ◽  
...  

Accelerated optimization of multilayer trench etches using model-based experimental design

2020 ◽  
Author(s):  
Kara Kearney ◽  
Sonali Chopra ◽  
Xilan Zhu ◽  
Yang Ban ◽  
Roger T. Bonnecaze ◽  
...  
Keyword(s):  
Experimental Design ◽  
Model Based

Isotropic plasma free Si trim for FinFET to GAA device architectures (Conference Presentation)

2020 ◽  
Author(s):  
Subhadeep Kal ◽  
Yusuke Oniki ◽  
Cheryl Alix ◽  
Karine Kenis ◽  
Efrain Altamirano-Sánchez ◽  
...  
Keyword(s):  
Isotropic Plasma

Challenges in the patterning of RRAM devices for analog computing applications (Conference Presentation)

2020 ◽  
Author(s):  
Iqbal Saraf ◽  
Shyam Sridhar ◽  
Christopher Catano ◽  
Sergey Voronin ◽  
Dexin Kong ◽  
...  
Keyword(s):  
Analog Computing

Holistic litho, films and etch for EUV DRAM storage node pad (Conference Presentation)

2020 ◽  
Author(s):  
Cyrus E. Tabery ◽  
Nader Shamma ◽  
Nicola Kissoon ◽  
Elisabeth Camerotto ◽  
Mircea Dusa ◽  
...  
Keyword(s):  
Storage Node
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