TrueMask® ILT MWCO: Full-chip curvilinear ILT in a day and full mask multi-beam and VSB writing in 12 hrs for 193i

Optical Microlithography XXXIII ◽

10.1117/12.2554867 ◽

2020 ◽

Author(s):

Linyong Pang ◽

Jeffrey Ungar ◽

Ali Bouaricha ◽

Lu Sha ◽

Michael Pomerantsev ◽

...

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