Optical Microlithography XXXIII
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Published By SPIE

9781510634213, 9781510634220
Latest Documents Most Cited Documents Contributed Authors Related Sources Related Keywords

Dual tone sub-resolution assist features to improve corner rounding

2020 ◽  
Author(s):  
Cheng Chi ◽  
Hao Tang ◽  
Oseo Park ◽  
Jing Xue ◽  
Jing Guo ◽  
...  

Advanced spectral engineering: Lithography performance improvements by high performance light source

2020 ◽  
Author(s):  
Kouichi Fujii ◽  
Takahito Kumazaki ◽  
Masakazu Hattori ◽  
Yosuke Fujimaki ◽  
Toshihiro Oga ◽  
...  
Keyword(s):  
Light Source ◽  
High Performance ◽  
Performance Improvements

TrueMask® ILT MWCO: Full-chip curvilinear ILT in a day and full mask multi-beam and VSB writing in 12 hrs for 193i

2020 ◽  
Author(s):  
Linyong Pang ◽  
Jeffrey Ungar ◽  
Ali Bouaricha ◽  
Lu Sha ◽  
Michael Pomerantsev ◽  
...  

Achieving stitchless full chip curvilinear ILT in a day (Conference Presentation)

2020 ◽  
Author(s):  
P. Jeffrey Ungar ◽  
Ali Bouaricha ◽  
Ryan Pearman ◽  
Linyong Pang ◽  
Aki Fujimura

Multi-focal imaging for improved depth of focus; principles and application to ArFi use cases (Conference Presentation)

2020 ◽  
Author(s):  
Will Conley ◽  
Josh Thornes ◽  
Paolo Alagna ◽  
Omar Zurita ◽  
Kuo-Tai Teng ◽  
...  
Keyword(s):  
Use Cases ◽  
Depth Of Focus

Comparison of different lithographic source optimization methods based on compressive sensing

2020 ◽  
Author(s):  
Zhiqiang Wang ◽  
Xu Ma ◽  
Rui Chen ◽  
Gonzalo Arce ◽  
Lisong Dong ◽  
...  
Keyword(s):  
Compressive Sensing ◽  
Optimization Methods

Holistic alignment approach for on-product overlay improvement on DUV lithography process with combined solutions

2020 ◽  
Author(s):  
Jigang Ma ◽  
Miao Yu ◽  
Cees Lambregts ◽  
Sotirios Tsiachris ◽  
Paul Böcker ◽  
...  
Keyword(s):  
Lithography Process

Evaluating and correcting pattern variability induced by OPC within regular array layout

2020 ◽  
Author(s):  
Christian Gardin ◽  
Raphael La Greca ◽  
Jean-Noël Pena ◽  
Laurent Depre ◽  
Elodie Sungauer
Keyword(s):  
Regular Array ◽  
Pattern Variability
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