TEM studies of and silicon slices implanted with B+ and BF 2 + ions after annealing and oxidation

Microscopy of Semiconducting Materials, 1983 ◽

10.1201/9781003069614-36 ◽

2020 ◽

pp. 235-240

Author(s):

M I J Beale ◽

G R Booker

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