Controlling Neutral Mixtures:  Thin Film Deposition via Laser Ablation and Selective Ionization of K4In4Sb6

1998 ◽  
Vol 10 (4) ◽  
pp. 1091-1095 ◽  
Author(s):  
Valentin Panayotov ◽  
Teresa L. T. Birdwhistell ◽  
Brent Koplitz
Keyword(s):  
Thin Film ◽  
Laser Ablation ◽  
Thin Film Deposition ◽  
Film Deposition ◽  
Selective Ionization

Observations on the growth of YBa2Cu3O7-δ thin films on MgO by pulsed-laser ablation

1991 ◽  
Vol 49 ◽  
pp. 1068-1069
Author(s):  
M. Grant Norton ◽  
C. Barry Carter
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Laser Ablation ◽  
Substrate Surface ◽  
Pulsed Laser ◽  
Pulsed Laser Ablation ◽  
Thin Film Deposition ◽  
Film Deposition ◽  
Laser Ablation Process ◽  
Deposition Parameters

Pulsed-laser ablation has been widely used to produce high-quality thin films of YBa2Cu3O7-δ on a range of substrate materials. The nonequilibrium nature of the process allows congruent deposition of oxides with complex stoichiometrics. In the high power density regime produced by the UV excimer lasers the ablated species includes a mixture of neutral atoms, molecules and ions. All these species play an important role in thin-film deposition. However, changes in the deposition parameters have been shown to affect the microstructure of thin YBa2Cu3O7-δ films. The formation of metastable configurations is possible because at the low substrate temperatures used, only shortrange rearrangement on the substrate surface can occur. The parameters associated directly with the laser ablation process, those determining the nature of the process, e g. thermal or nonthermal volatilization, have been classified as ‘primary parameters'. Other parameters may also affect the microstructure of the thin film. In this paper, the effects of these ‘secondary parameters' on the microstructure of YBa2Cu3O7-δ films will be discussed. Examples of 'secondary parameters' include the substrate temperature and the oxygen partial pressure during deposition.

Crystalline SiC thin film deposition by laser ablation: influence of laser surface activation

1998 ◽  
Vol 66 (2) ◽  
pp. 183-187 ◽  
Author(s):  
M. Diegel ◽  
F. Falk ◽  
R. Hergt ◽  
H. Hobert ◽  
H. Stafast
Keyword(s):  
Thin Film ◽  
Laser Ablation ◽  
Thin Film Deposition ◽  
Film Deposition ◽  
Laser Surface ◽  
Surface Activation

AIN thin film deposition by pulsed laser ablation of Al in NH3

1997 ◽  
Vol 295 (1-2) ◽  
pp. 77-82 ◽  
Author(s):  
A. Giardini Guidoni ◽  
A. Mele ◽  
T.M. Di Palma ◽  
C. Flamini ◽  
S. Orlando ◽  
...  
Keyword(s):  
Thin Film ◽  
Laser Ablation ◽  
Pulsed Laser ◽  
Pulsed Laser Ablation ◽  
Thin Film Deposition ◽  
Film Deposition

scholarly journals Modeling of plume dynamics in laser ablation processes for thin film deposition of materials

1996 ◽  
Vol 3 (5) ◽  
pp. 2203-2209 ◽  
Author(s):  
J. N. Leboeuf ◽  
K. R. Chen ◽  
J. M. Donato ◽  
D. B. Geohegan ◽  
C. L. Liu ◽  
...  
Keyword(s):  
Thin Film ◽  
Laser Ablation ◽  
Thin Film Deposition ◽  
Film Deposition ◽  
Plume Dynamics

ChemInform Abstract: Laser Ablation and Thin Film Deposition

ChemInform ◽  
2011 ◽  
Vol 42 (5) ◽  
pp. no-no
Author(s):  
Christof W. Schneider ◽  
Thomas Lippert
Keyword(s):  
Thin Film ◽  
Laser Ablation ◽  
Thin Film Deposition ◽  
Film Deposition
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