Effect of Nail Arrangement on the Behavior of Convex Corner Soil-Nailed Walls

2020 ◽  
Vol 146 (5) ◽  
pp. 04020026 ◽  
Author(s):  
M. Moradi ◽  
A. Pooresmaeili Babaki ◽  
M. Sabermahani
Keyword(s):  
Convex Corner

Pattern induced convex corner undercutting of oriented silicon microridges in potassium hydroxide

2015 ◽  
Vol 23 (1) ◽  
pp. 75-80 ◽  
Author(s):  
S. B. Inayat ◽  
M. Ombaba ◽  
M. Saif Islam
Keyword(s):  
Potassium Hydroxide ◽  
Convex Corner

Pembentukan Diafragma Beralun Silikon Dengan Menggunakan Teknik Punaran Anisotropik

2012 ◽  
Author(s):  
Norhayati Soin ◽  
Burhanuddin Yeop Majlis
Keyword(s):  
Key Words ◽  
Experimental Studies ◽  
Anisotropic Etching ◽  
Etching Technique ◽  
Convex Corner ◽  
Mask Design ◽  
Etching Mask ◽  
Corrugated Diaphragm

Kertas ini memaparkan kajian mengenai pembentukan diafragma beralun silikon dengan menggunakan teknik punaran anisotropik di mana larutan kalium hidroksida digunakan sebagai larutan pemunar. Kajian ini meliputi pengoptimuman topeng punaran bagi mengatasi masalah keadaan potong bawah penjuru yang berlaku pada struktur berpenjuru cembung diafragma beralun yang terpunar. Hasil yang diperolehi daripada kajian simulasi dan eksperimen membuktikan bahawa pengoptimuman topeng punaran yang telah dilakukan berkemampuan mengatasi masalah potong bawah penjuru diafragma beralun silikon. Kata kunci: diafragma beralun, punaran anisotropik, pengoptimuman topeng This paper presents the study of the formation of a perfect silicon corrugated diaphragm using anisotropic etching technique. Potassim hydroxide (KOH) solution is used as the etching solvent in this study. This study includes optimization of the etching mask, in order to avoid the problem of corner undercutting which exists on all convex corner structures on the etched corrugated diaphragm. Results from the simulation and experimental studies have proved that the optimized etching mask design was able to overcome the problem of convex corner undercutting. Key words: corrugated diaphragm, anisotropic etching, mask optimization

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