Influence of sputtering pressure on the properties of hydrogenated amorphous‐silicon carbon alloy films prepared by magnetron sputtering of silicon in methane‐argon gas mixtures

1986 ◽  
Vol 59 (7) ◽  
pp. 2498-2502 ◽  
Author(s):  
Nobuo Saito
1988 ◽  
Vol 38 (12) ◽  
pp. 8371-8376 ◽  
Author(s):  
Xixiang Xu ◽  
Akihisa Okumura ◽  
Akiharu Morimoto ◽  
Minoru Kumeda ◽  
Tatsuo Shimizu

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