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Chemical characteristics of negative-tone chemically amplified resist for advanced mask making
Mapping Intimacies
◽
10.1117/12.557692
◽
2004
◽
Author(s):
Kazumasa Takeshi
◽
Naoko Ito
◽
Daisuke Inokuchi
◽
Yasushi Nishiyama
◽
Yuichi Fukushima
◽
...
Keyword(s):
Chemical Characteristics
◽
Chemically Amplified
◽
Mask Making
◽
Chemically Amplified Resist
◽
Negative Tone
Download Full-text
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References
Chemical characteristics of negative-tone chemically amplified resist for advanced mask making: II
10.1117/12.569516
◽
2004
◽
Author(s):
Kazumasa Takeshi
◽
Masahito Tanabe
◽
Daisuke Inokuchi
◽
Yuichi Fukushima
◽
Yasuhiro Okumoto
◽
...
Keyword(s):
Chemical Characteristics
◽
Chemically Amplified
◽
Mask Making
◽
Chemically Amplified Resist
◽
Negative Tone
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Electron beam lithography in thick negative tone chemically amplified resist: Controlling sidewall profile in deep trenches and channels
Microelectronic Engineering
◽
10.1016/j.mee.2014.08.006
◽
2014
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Vol 130
◽
pp. 1-7
◽
Cited By ~ 2
Author(s):
Mihir Sarkar
◽
Y.N. Mohapatra
Keyword(s):
Electron Beam
◽
Electron Beam Lithography
◽
Chemically Amplified
◽
Chemically Amplified Resist
◽
Negative Tone
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Negative-tone chemically-amplified resist development for high resolution hybrid lithography
Microelectronic Engineering
◽
10.1016/s0167-9317(04)00110-8
◽
2004
◽
Vol 73-74
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pp. 271-277
◽
Cited By ~ 3
Author(s):
S LANDIS
Keyword(s):
High Resolution
◽
Chemically Amplified
◽
Chemically Amplified Resist
◽
Negative Tone
Download Full-text
Investigation of e-beam sensitive negative-tone chemically amplified resists for binary mask making
10.1117/12.504185
◽
2003
◽
Cited By ~ 3
Author(s):
Mathias Irmscher
◽
Lothar Berger
◽
Dirk Beyer
◽
Joerg Butschke
◽
Peter Dress
◽
...
Keyword(s):
Binary Mask
◽
Chemically Amplified
◽
Mask Making
◽
Negative Tone
◽
Chemically Amplified Resists
Download Full-text
Characteristics of negative-tone chemically amplified resist (MES-EN1G) for 50-keV EB mask writing system
10.1117/12.476936
◽
2002
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Author(s):
Takehiro Kondoh
◽
Masamitsu Itoh
◽
Toshiyuki Kai
Keyword(s):
Writing System
◽
Chemically Amplified
◽
Chemically Amplified Resist
◽
Negative Tone
Download Full-text
Negative tone chemically amplified resist formulation optimizations for ultra high-resolution lithography
Microelectronic Engineering
◽
10.1016/s0167-9317(03)00186-2
◽
2003
◽
Vol 67-68
◽
pp. 274-282
◽
Cited By ~ 4
Author(s):
J. Saint-Pol
◽
S. Landis
◽
C. Gourgon
◽
S. Tedesco
◽
R. Hanawa
◽
...
Keyword(s):
High Resolution
◽
Chemically Amplified
◽
Chemically Amplified Resist
◽
Negative Tone
Download Full-text
Development of positive-tone chemically amplified resist for LEEPL mask making
10.1117/12.617283
◽
2005
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Author(s):
Yoshiyuki Negishi
◽
Kazumasa Takeshi
◽
Takashi Yoshii
◽
Keishi Tanaka
◽
Yasuhiro Okumoto
Keyword(s):
Chemically Amplified
◽
Mask Making
◽
Chemically Amplified Resist
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Mask patterning process using the negative tone chemically amplified resist TOK OEBR-CAN024
10.1117/12.557686
◽
2004
◽
Cited By ~ 1
Author(s):
Mathias Irmscher
◽
Dirk Beyer
◽
Joerg Butschke
◽
Peter Hudek
◽
Corinna Koepernik
◽
...
Keyword(s):
Chemically Amplified
◽
Chemically Amplified Resist
◽
Negative Tone
Download Full-text
90-nm mask making processes using the positive tone chemically amplified resist FEP171
10.1117/12.518043
◽
2003
◽
Cited By ~ 3
Author(s):
Joerg Butschke
◽
Dirk Beyer
◽
Chris Constantine
◽
Peter Dress
◽
Peter Hudek
◽
...
Keyword(s):
Chemically Amplified
◽
Mask Making
◽
Chemically Amplified Resist
Download Full-text
Effect of processing on surface roughness for a negative-tone chemically amplified resist exposed by x-ray lithography
10.1117/12.312477
◽
1998
◽
Cited By ~ 8
Author(s):
Geoffrey W. Reynolds
◽
James W. Taylor
Keyword(s):
Surface Roughness
◽
X Ray
◽
Chemically Amplified
◽
Chemically Amplified Resist
◽
Negative Tone
Download Full-text
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