Laser Annealing of Te-Implanted III-V Semiconductors Studied by Mossbauer Spectroscopy
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ABSTRACTThe laser annealing behaviour of Te-implanted GaAs, GaSb, GaP and InP has been studied by Mössbauer Spectroscopy. The spectra of the as-implanted samples are characterized by a quadrupole split multiplet, showing that the Te ions come to rest at non-substitutional lattice sites. The laser annealing is shown to shift the implanted impurities towards substitutional positions. The efficiency of the laser annealing procedure is very similar for all lattices under study.
1984 ◽
Vol 42
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pp. 183-192
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1986 ◽
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pp. 241-245
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1979 ◽
Vol 40
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pp. C2-477-C2-479
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1976 ◽
Vol 37
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pp. C6-879-C6-882
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1979 ◽
Vol 40
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pp. C2-107-C2-114
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1976 ◽
Vol 37
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pp. C6-534-C6-534
1979 ◽
Vol 40
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pp. C2-339-C2-341
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