Laser Annealing of Te-Implanted III-V Semiconductors Studied by Mossbauer Spectroscopy

1980 ◽  
Vol 3 ◽  
Author(s):  
M. Van Rossum ◽  
I. Dezsi ◽  
G. Langouche ◽  
J. De Bruyn ◽  
R. Coussement

ABSTRACTThe laser annealing behaviour of Te-implanted GaAs, GaSb, GaP and InP has been studied by Mössbauer Spectroscopy. The spectra of the as-implanted samples are characterized by a quadrupole split multiplet, showing that the Te ions come to rest at non-substitutional lattice sites. The laser annealing is shown to shift the implanted impurities towards substitutional positions. The efficiency of the laser annealing procedure is very similar for all lattices under study.

1979 ◽  
Vol 40 (C2) ◽  
pp. C2-14-C2-16
Author(s):  
T. Toriyama ◽  
K. Saneyoshi ◽  
K. Hisatake

1976 ◽  
Vol 37 (C6) ◽  
pp. C6-534-C6-534
Author(s):  
J. H. HOLLOWAY ◽  
G. J. SCHROBILGEN ◽  
S. BUKSHPAN ◽  
W. HILBRANTS ◽  
H. DE WAARD

1979 ◽  
Vol 40 (C2) ◽  
pp. C2-339-C2-341 ◽  
Author(s):  
A. Gérard ◽  
F. Grandjean ◽  
J. Preudhomme ◽  
P. Tarte

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