Multiscale analysis of single- and multiple-pulse laser-induced damages in HfO2/SiO2 multilayer dielectric films at 532 nm
2015 ◽
Vol 13
(9)
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pp. 091404-91408
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Keyword(s):
532 Nm
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1990 ◽
Vol 46
(1-4)
◽
pp. 231-234
◽
ISPRS - International Archives of the Photogrammetry Remote Sensing and Spatial Information Sciences
◽
2013 ◽
Vol XL-1/W1
◽
pp. 93-98
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