neutron depth profile
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Neutron Depth Profiles of Boron Implanted Semiconductors

MRS Proceedings ◽

10.1557/proc-166-331 ◽

1989 ◽

Vol 166 ◽

Author(s):

Robert C. Bowman ◽

John F. Knudsen ◽

R. Gregory Downing

Keyword(s):

Depth Profile ◽

Depth Profiles ◽

Computer Codes ◽

Neutron Depth Profile

ABSTRACTThe nondestructive neutron depth profile (NDP) technique has been used to measure boron (10B) distributions in Si and Hg0.7Cd0.3 Te after multiple energy ion implants. The NDP results are compared with simulations generated by TRIM and SUPREM computer codes. The influence of SiO2 films on the boron profiles was examined and the effects of thermal anneals are also described.

Determination of boron by the neutron depth profile (NDP) technique for VLSI processing application

Journal of Radioanalytical and Nuclear Chemistry ◽

10.1007/bf02050510 ◽

1987 ◽

Vol 113 (2) ◽

pp. 379-382

Author(s):

T. Z. Hossain ◽

P. M. Zeitzoff