neutron depth profile
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1989 ◽  
Vol 166 ◽  
Author(s):  
Robert C. Bowman ◽  
John F. Knudsen ◽  
R. Gregory Downing

ABSTRACTThe nondestructive neutron depth profile (NDP) technique has been used to measure boron (10B) distributions in Si and Hg0.7Cd0.3 Te after multiple energy ion implants. The NDP results are compared with simulations generated by TRIM and SUPREM computer codes. The influence of SiO2 films on the boron profiles was examined and the effects of thermal anneals are also described.





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