2000 Semiconductor Manufacturing Technology Workshop (Cat. No.00EX406)
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DRAM Production Strategy in Taiwan

2000 Semiconductor Manufacturing Technology Workshop (Cat. No.00EX406) ◽

10.1109/smtw.2000.883095 ◽

2005 ◽

Author(s):

M.L. Chen

Keyword(s):

Production Strategy

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Technical and Business Issues of 300mm Inplementation

2000 Semiconductor Manufacturing Technology Workshop (Cat. No.00EX406) ◽

10.1109/smtw.2000.883086 ◽

2005 ◽

Author(s):

R. Goodall

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Perspective of Semiconductor Manufacturing from IC Design

2000 Semiconductor Manufacturing Technology Workshop (Cat. No.00EX406) ◽

10.1109/smtw.2000.883085 ◽

2005 ◽

Author(s):

H.S. Lu

Keyword(s):

Semiconductor Manufacturing ◽

Ic Design

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Global ESH cooperation & Technical Advances

2000 Semiconductor Manufacturing Technology Workshop (Cat. No.00EX406) ◽

10.1109/smtw.2000.883096 ◽

2005 ◽

Author(s):

B. Duffin

Keyword(s):

Technical Advances

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Statistical modeling of MOS devices and ICs based on end-of-line manufacturing data

2000 Semiconductor Manufacturing Technology Workshop (Cat. No.00EX406) ◽

10.1109/smtw.2000.883104 ◽

2002 ◽

Author(s):

Q. Zhang ◽

J.J. Liou ◽

J. McMacken ◽

K. Stiles ◽

J. Thomson ◽

...

Keyword(s):

Statistical Modeling ◽

Mos Devices ◽

Manufacturing Data

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Ultrathin (2.7 nm) oxy-nitride for suppressing boron penetration characterized by direct hole tunneling current in p+/pMOS

2000 Semiconductor Manufacturing Technology Workshop (Cat. No.00EX406) ◽

10.1109/smtw.2000.883090 ◽

2002 ◽

Author(s):

Chih-hsing Yu ◽

Ming-chen Chen ◽

Min-hwa Chi

Keyword(s):

Tunneling Current ◽

Boron Penetration

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A cost-based heuristic for statistically determining sampling frequency in a wafer fab

2000 Semiconductor Manufacturing Technology Workshop (Cat. No.00EX406) ◽

10.1109/smtw.2000.883099 ◽

2002 ◽

Cited By ~ 2

Author(s):

Chen-Fu Chien ◽

Shao-Chung Hsu ◽

S. Peng ◽

Chia-Hung Wu

Keyword(s):

Sampling Frequency ◽

Wafer Fab

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Run-to-run control schemes for CMP process subject to deterministic drifts

2000 Semiconductor Manufacturing Technology Workshop (Cat. No.00EX406) ◽

10.1109/smtw.2000.883103 ◽

2002 ◽

Cited By ~ 3

Author(s):

Ruey-Shan Guo ◽

Argon Chen ◽

Jin-Jung Chen

Keyword(s):

Control Schemes

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Translating fab cycle time and output targets into production control requirements for tool groups

2000 Semiconductor Manufacturing Technology Workshop (Cat. No.00EX406) ◽

10.1109/smtw.2000.883087 ◽

2002 ◽

Author(s):

Ming-Der Hu ◽

Shi-Chung Chang

Keyword(s):

Cycle Time ◽

Production Control

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CMP area automation in SMIF fab

2000 Semiconductor Manufacturing Technology Workshop (Cat. No.00EX406) ◽

10.1109/smtw.2000.883101 ◽

2002 ◽

Author(s):

Yuh-Dean Tsai ◽

Hwa-Shin Huang

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2000 Semiconductor Manufacturing Technology Workshop (Cat. No.00EX406)Latest Publications

TOTAL DOCUMENTS

H-INDEX

Published By IEEE

DRAM Production Strategy in Taiwan

Technical and Business Issues of 300mm Inplementation

Perspective of Semiconductor Manufacturing from IC Design

Global ESH cooperation & Technical Advances

Statistical modeling of MOS devices and ICs based on end-of-line manufacturing data

Ultrathin (2.7 nm) oxy-nitride for suppressing boron penetration characterized by direct hole tunneling current in p+/pMOS

A cost-based heuristic for statistically determining sampling frequency in a wafer fab

Run-to-run control schemes for CMP process subject to deterministic drifts

Translating fab cycle time and output targets into production control requirements for tool groups

CMP area automation in SMIF fab

2000 Semiconductor Manufacturing Technology Workshop (Cat. No.00EX406)
Latest Publications