Journal of Micro/Nanopatterning, Materials, and Metrology
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Published By SPIE-Intl Soc Optical Eng

2708-8340
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Fineline circuits realization with liquid photoresist and DMD-based photolithographic technique for space electronics applications

2022 ◽  
Vol 21 (01) ◽  
Author(s):  
Chinnayellappa Hanumanth Rao ◽  
Amrendra Pratap Singh ◽  
Avinash Kothuru ◽  
Bondapalli K. S. V. L. Varaprasad ◽  
Sanket Goel
Keyword(s):  
Space Electronics

Enabling nanoimprint simulator for quality verification: process-design co-optimization toward high-volume manufacturing

2022 ◽  
Vol 21 (01) ◽  
Author(s):  
Junichi Seki ◽  
Yuichiro Oguchi ◽  
Naoki Kiyohara ◽  
Koshiro Suzuki ◽  
Kohei Nagane ◽  
...  
Keyword(s):  
Process Design ◽  
High Volume ◽  
Verification Process

Overlay models for nanoimprint lithography

2022 ◽  
Vol 21 (01) ◽  
Author(s):  
Nilabh Roy ◽  
Mario Meissl ◽  
Takahiro Yoshida ◽  
Anshuman Cherala ◽  
Xiaoming Lu ◽  
...  
Keyword(s):  
Nanoimprint Lithography

Multi-field imprint technology: enabling the productivity enhancement of nano-imprint lithography

2021 ◽  
Vol 21 (01) ◽  
Author(s):  
Tetsuro Nakasugi ◽  
Kazuya Fukuhara ◽  
Motofumi Komori ◽  
Soichi Inoue ◽  
Koji Hashimoto ◽  
...  
Keyword(s):  
Imprint Lithography ◽  
Nano Imprint ◽  
Productivity Enhancement

scholarly journals Breakthrough curvilinear ILT enabled by multi-beam mask writing

2021 ◽  
Vol 20 (04) ◽  
Author(s):  
Linyong (Leo) Pang ◽  
Ezequiel Vidal Russell ◽  
Bill Baggenstoss ◽  
Michael Lee ◽  
Jennefir Digaum ◽  
...  

scholarly journals Accurate prediction of EUV lithographic images and 3D mask effects using generative networks

2021 ◽  
Vol 20 (04) ◽  
Author(s):  
Abdalaziz Awad ◽  
Philipp Brendel ◽  
Peter Evanschitzky ◽  
Dereje S. Woldeamanual ◽  
Andreas Rosskopf ◽  
...  
Keyword(s):  
Accurate Prediction
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