Some Comments and Corrections on the Defect Diffusion Models of Dielectric Relaxation

1985 ◽  
Vol 128 (1) ◽  
pp. 119-131 ◽  
Author(s):  
S. Bozdemir
1978 ◽  
Vol 33 (11) ◽  
pp. 1294-1306 ◽  
Author(s):  
Rainer Kimmich ◽  
Gerhard Voigt

The effect of diffusing defects such as vacancies, displacements, torsions, and rotational isomers on the nmr and dielectric relaxation behaviour is treated under various aspects. The influences of the dimensionality of the diffusion process, of the mutual hindrance, of the defect concentration, of the defect length and of the mean lifetime are derived and discussed.


1980 ◽  
Vol 73 (8) ◽  
pp. 4022-4025 ◽  
Author(s):  
James L. Skinner ◽  
Peter G. Wolynes

1976 ◽  
Vol 31 (7) ◽  
pp. 693-696 ◽  
Author(s):  
R. Kimmich

Abstract Nuclear magnetic and dielectric relaxation formulas are given for a model of limited diffusion of defects. The limitation is introduced by the assumption of fixed reflecting barriers on both sides of the defect. The diffusion process is assumed to be one-dimensional and continuous. The effect of the finite length of the defects is included in the presented treatment.


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