Atom Lithography with Cesium Atomic Beams

2001 ◽  
pp. 195-206
Author(s):  
F. Lison ◽  
D. Haubrich ◽  
D. Meschede
2006 ◽  
Vol 05 (01) ◽  
pp. 145-156 ◽  
Author(s):  
KAMLESH ALTI ◽  
ALIKA KHARE

A new configuration of microscopic square arrays of atomic beams in the presence of TEM 00 mode laser, acting as atomic lens, is proposed for atom lithography via dipole force. Simulated patterns using such configuration for rubidium atoms show the formation of nanostructures with periodicity less than λ/2.


1997 ◽  
Vol 35 (1-4) ◽  
pp. 357-359 ◽  
Author(s):  
Victor T. Petrashov
Keyword(s):  

Author(s):  
H. Merimeche ◽  
R. Bertram ◽  
D. Haubrich ◽  
M. Mutzel ◽  
P. Rosenbusch ◽  
...  
Keyword(s):  

2003 ◽  
Vol 15 (6) ◽  
pp. R233-R255 ◽  
Author(s):  
Markus K Oberthaler ◽  
Tilman Pfau

Author(s):  
M. Ellilä ◽  
T.O. Niinikoski ◽  
S. Penttilä
Keyword(s):  

1996 ◽  
Vol 62 (4) ◽  
pp. 323-327 ◽  
Author(s):  
M. D. Hoogerland ◽  
J. P. J. Driessen ◽  
E. J. D. Vredenbregt ◽  
H. J. L. Megens ◽  
M. P. Schuwer ◽  
...  
Keyword(s):  

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