scholarly journals An integrated system for ultra-precision machine tool design in conceptual and fundamental design stage

Author(s):  
Wanqun Chen ◽  
Xichun Luo ◽  
Hao Su ◽  
Frank Wardle
1997 ◽  
Vol 119 (4B) ◽  
pp. 713-716 ◽  
Author(s):  
S. B. Rao

This paper reviews the key developments in the area of metal cutting machine tool design over the last three decades, from a very practical perspective. While defining the drivers of machine tool design as higher productivity and higher accuracy, this paper examines the advances in design from the needs of these two drivers.


Author(s):  
Guo-Da Chen ◽  
Ya-Zhou Sun ◽  
Fei-Hu Zhang ◽  
Li-Hua Lu ◽  
Wan-Qun Chen ◽  
...  

Author(s):  
Hao Duan ◽  
Shinya Morita ◽  
Takuya Hosobata ◽  
Masahiro Takeda ◽  
Yutaka Yamagata

Abstract Aspherical or free-form optical surface machining using an ultra-precision machine tool is a common and effective method in precision optics manufacturing. However, this method sometimes causes waviness due to the machine’s motion in mid-spatial frequency (MSF) form deviations. This waviness lowers the quality of the optical surface. To address this problem, we use the waviness of the axial displacement of the ultra-precision machine tool. The waviness is obtained by a non-contact on-machine metrology (OMM) system that measures an optical flat as a correction reference curve, which is used to correct the surface of the workpiece to reduce the effect of waviness in advance. The OMM system consists of a displacement probe and a machine tool axis position capture device. The probe system uses a confocal chromatic probe on an ultra-precision machine tool to evaluate the form deviation of the workpiece with 1 nm resolution. The axis position capture system uses a signal branch circuit of linear scale on each axis from the ultra-precision machine tool. The OMM system is tested in terms of accuracy and repeatability. In comparison to the results of the shaper cutting of an oxygen-free copper (OFC) workpiece with feed-forward correction, we were able to reduce the profile error from 125.3 nm to 42.1 nm in p-v (peak to valley) and eventually also reduced the waviness.


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