A Nested Schur Decomposition Approach for Multiperiod Optimization of Chemical Processes

2021 ◽  
pp. 107509
Author(s):  
Noriyuki Yoshio ◽  
Lorenz T. Biegler
Keyword(s):  
Chemical Processes ◽  
Schur Decomposition ◽  
Decomposition Approach ◽  
Multiperiod Optimization

Electrical Damage Due to Low Energy Plasma Processing of GaAs Structures

1991 ◽  
Vol 223 ◽  
Author(s):  
Hans P. Zappe ◽  
Gudrun Kaufel
Keyword(s):  
Chemical Processes ◽  
Low Energy ◽  
Electrical Behavior ◽  
Rapid Thermal Anneal ◽  
High Temperature Anneal ◽  
Significant Damage ◽  
Low Energies ◽  
Long Time ◽  
Physical Plasma

ABSTRACTThe effect of numerous plasma reative ion etch and physical milling processes on the electrical behavior of GaAs bulk substrates has been investigated by means of electric microwave absorption. It was seen that plasma treatments at quite low energies may significantly affect the electrical quality of the etched semiconductor. Predominantly physical plasma etchants (Ar) were seen to create significant damage at very low energies. Chemical processes (involving Cl or F), while somewhat less pernicious, also gave rise to electrical substrate damage, the effect greater for hydrogenic ambients. Whereas rapid thermal anneal treatments tend to worsen the electrical integrity, some substrates respond positively to long-time high temperature anneal steps.

Parametrical Synthesis of Linear Controllers in Aperiodical Systems on Basis of Decomposition Approach

2019 ◽  
Vol 12 (4) ◽  
pp. 192
Author(s):  
Sergey Anatolevich Gayvoronskiy ◽  
Tatiana Ezangina ◽  
Maxim Pushkarev ◽  
Ivan Khozhaev
Keyword(s):  
Decomposition Approach ◽  
Linear Controllers
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