An ultra heat-resistant polyimide formulated with photo-base generator for alkaline-developable, negative-type photoresist
2020 ◽
Vol 157
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pp. 104760
Keyword(s):
2018 ◽
Vol 2018
(46)
◽
pp. 34-37
2014 ◽
Vol 134
(2)
◽
pp. 105-109
Keyword(s):
2012 ◽
Vol 53
(6)
◽
pp. 1090-1093
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